Design and fabrication considerations of EUVL collectors for HVM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Bianucci, G ^a   Cassol, G L ^a   Kools, J ^a   Prea, M ^a   Salmaso, G ^a   Valsecchi, G ^a   Zocchi, F E ^a   Bolshukhin, D ^b   Schurmann M ^b   Schriever, G ^b   Mader, A ^c   Zink, P ^c  

^a Media Lario Technologies   (Italy)

^b XTREME Technologies GmbH   (Germany)

^c PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

Collection efficiency; Collector; EUV; EUVL; Extreme ultra violet lithography; Thermal management

Indexed keywords

COLLECTION EFFICIENCY; COLLECTOR; EUV; EUVL; THERMAL MANAGEMENT;

COOLING; COOLING WATER; DEBRIS; DUST COLLECTORS; OPTICAL DESIGN; RUTHENIUM; TECHNOLOGICAL FORECASTING; TECHNOLOGY; TEMPERATURE CONTROL; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149120548     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813652     Document Type: Conference Paper

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