Laser-produced plasma source development for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Endo, Akira ^a,b   Komori, Hiroshi ^a,b   Ueno, Yoshifumi ^a,b   Nowak, Krzysztof M ^a,b   Takayuki, Yabu ^a,b   Tatsuya, Yanagida ^a,b   Suganuma, Takashi ^a,b   Asayama, Takeshi ^a,b   Someya, Hiroshi ^a,b   Hoshino, Hideo ^a,b   Nakano, Masaki ^a,b   Moriya, Masato ^a,b   Nishisaka, Toshihiro ^a,b   Abe, Tamotsu ^a,b   Sumitani, Akira ^a,b   Nagano, Hitoshi ^a,b   Sasaki, Youichi ^a,b   Nagai, Shinji ^a,b   Watanabe, Yukio ^a,b   Soumagne, Georg ^a,b   Ishihara, Takanobu ^a,b   Wakabayashi, Osamu ^a,b   Kakizaki, Kouji ^a,b   Mizoguchi, Hakaru ^a,b   more..

^a EUVA/Gigaphoton ^*  (Japan)

^b EUVA/Gigaphoton/Komatsu   (Japan)

Author keywords

CO2 laser; EUV light source; Laser produced plasma

Indexed keywords

AVERAGE POWER; CO2 LASER; CONTINUOUS OPERATION; EUV LIGHT SOURCE; EUV LIGHT SOURCES; EUV LITHOGRAPHY; EUV SOURCE; IN-BAND; LASER SYSTEMS; LASER-PRODUCED PLASMA SOURCES; MAGNETIC PLASMA; MASTER OSCILLATOR POWER AMPLIFIERS; POWER-SCALING; PULSE WIDTH; PULSED CO; SMALL SIZE; TIN PLASMA; TIN VAPOR; VACUUM CHAMBERS;

CONVERSION EFFICIENCY; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PRODUCED PLASMAS; LASERS; LIGHT; LIGHTING; MAGNETIC FIELDS; MAGNETIC FLUX; OPTICAL PHASE CONJUGATION; POWER AMPLIFIERS; TIN; ULTRAVIOLET DEVICES;

PULSED LASER APPLICATIONS;

EID: 67149094746     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813639     Document Type: Conference Paper

References (6)

1. Rob Hartman, Closing address presentation at 2006 International EUVL Symposium, October 2006, Barcelona, Spain.
2. K. Nishihara, A. Sasaki, A. Sunahara, and T. Nishikawa, EUV Sources for Lithography, Chap. 11, ed. V. Bakshi, SPIE, Bellingham, 2005.
3. 2 and Nd:YAG laser-produced tin plasmas" Appl. Phys. Lett. 87, 041503 (2005)
4. 2 laser", Proc. SPIE 6921, 692131 (2008)
5. M. Nakano, T. Yabu, H. Someya, T. Abe, G. Soumagne, A. Endo, A. Sumitani, "Sn droplet target development for laser produced plasma EUV light source", Proc. SPIE 6921, 692130 (2008)
6. 2 laser-produced Sn plasma," Proc. SPIE 6921, 692112Z (2008)