100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Mizoguchi, Hakaru ^b   Abe, Tamotsu ^a   Watanabe, Yukio ^a   Ishihara, Takanobu ^a   Ohta, Takeshi ^a   Hori, Tsukasa ^a   Yanagida, Tatsuya ^a   Nagano, Hitoshi ^a   Yabu, Takayuki ^a   Nagai, Shinji ^a   Soumagne, Georg ^a   Kurosu, Akihiko ^a   Nowak, Krzysztof M ^a   Suganuma, Takashi ^a   Moriya, Masato ^a   Kakizaki, Kouji ^a   Sumitani, Akira ^a   Kameda, Hidenobu ^b   Nakarai, Hiroaki ^b   Fujimoto, Junichi ^b  

^a EUVA   (Japan)

^b Gigaphoton   (Japan)

Author keywords

CO2 laser; EUV; EUV light source; laser produced plasma; Lithography

Indexed keywords

CO2 LASER; CONTINUOUS OPERATION; DOUBLE PULSE; DUTY CYCLES; ENGINEERING DATA; EUV; EUV LIGHT SOURCES; EUV LITHOGRAPHY; GENERATION SYSTEMS; LASER SYSTEMS; LASER-PRODUCED PLASMA SOURCES; MAGNETIC MITIGATION; OPERATION CONDITIONS; PERFORMANCE STATUS; PRELIMINARY DATA; SHORT PULSE;

CARBON DIOXIDE; CONVERSION EFFICIENCY; LASER PRODUCED PLASMAS; LIGHT SOURCES; LITHOGRAPHY; TIN;

ULTRAVIOLET LASERS;

EID: 79957963197     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.880382     Document Type: Conference Paper

References (13)

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