LPP EUV light source employing high power CO2 laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Hoshino, Hideo ^a   Suganuma, Takashi ^a   Asayama, Takeshi ^a   Nowak, Krzysztof ^a   Moriya, Masato ^a   Abe, Tamotsu ^a   Endo, Akira ^a   Sumitani, Akira ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

CO2 laser; EUV; Fast axial flow; Laser produced plasma; Rf excited

Indexed keywords

AVERAGE POWER; EUV; EUV LIGHT SOURCES; EXPERIMENTAL DATA; FAST AXIAL FLOW; GOOD BEAM QUALITY; HIGH-POWER; IN-BAND; LASER POWER; LASER SYSTEMS; LOW ENERGY IONS; LOW-DEBRIS; MASTER OSCILLATOR POWER AMPLIFIERS; OUT-OF-BAND RADIATION; PULSE WIDTH; REPETITION RATE; RF-EXCITED; SHORT PULSE; SINGLE LASERS;

DEBRIS; LASER BEAMS; LASER PRODUCED PLASMAS; LIGHT SOURCES; OPTICAL PHASE CONJUGATION; POWER AMPLIFIERS; PULSE REPETITION RATE; TIN; TIN PLATE; ULTRASHORT PULSES;

CARBON DIOXIDE;

EID: 63649145582     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771847     Document Type: Conference Paper

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