Wideband mechanical response of a high-Q silicon double-paddle oscillator

Journal of Micromechanics and Microengineering

Volumn 21, Issue 6, 2011, Pages

  Borrielli, A ^a,b   Bonaldi, M ^a,b   Serra, E ^c   Bagolini, A ^a   Conti, L ^d  

^a FONDAZIONE BRUNO KESSLER   (Italy)

^b INFN TIFPA   (Italy)

^c UNIVERSITY OF TRENTO   (Italy)

^d SEZIONE DI PADOVA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DIMENSIONAL TOLERANCE; FABRICATION PROCESS; FINITE ELEMENT PROCEDURE; IN-VACUUM; LIMIT SETS; MECHANICAL QUALITY FACTORS; MECHANICAL RESPONSE; QUALITY FACTORS; RESIDUAL GAS; RESONANT MODE; ROOM TEMPERATURE; THERMOELASTIC DISSIPATION; WIDE-BAND;

EID: 79957944099     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/6/065019     Document Type: Article

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