Micromachined array-type Mirau interferometer for parallel inspection of MEMS

Journal of Micromechanics and Microengineering

Volumn 21, Issue 6, 2011, Pages

  Albero, J ^a   Bargiel, S ^a   Passilly, N ^a   Dannberg, P ^b   Stumpf, M ^b   Zeitner, U D ^b   Rousselot, C ^a   Gastinger, K ^c   Gorecki, C ^a  

^a FEMTO ST INSTITUTE   (France)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^c SINTEF   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAY-TYPE; BEAM SPLITTERS; DIELECTRIC MULTILAYERS; DIFFRACTIVE GRATING; FABRICATION PROCESS; FREE SPACE; GLASS WAFER; INSPECTION SYSTEM; KEY ELEMENTS; LOW COHERENCE INTERFEROMETRY; MATRIX; MEASUREMENT TIME; MEMS SENSORS; MICRO MIRROR; MICRO-OPTICAL COMPONENTS; MICROMACHINED; MIRAU INTERFEROMETER; REFRACTIVE MICROLENSE; SILICON MICROMACHINING; SPHERICAL ABERRATIONS;

GLASS; INTERFEROMETERS; SILICON WAFERS;

INSPECTION;

EID: 79957943688     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/6/065005     Document Type: Article

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