메뉴 건너뛰기




Volumn 5, Issue 5-6, 2011, Pages 202-204

Excellent silicon surface passivation with 5 Å thin ALD Al2O3 layers: Influence of different thermal post-deposition treatments

Author keywords

Al2O3; Atomic layer deposition; Silicon; Surface passivation

Indexed keywords

A-THERMAL; AL2O3; ATOMIC LAYER; BORON-DOPED SILICON; CAPPING LAYER; CRYSTALLINE SILICON SURFACES; EMITTER SATURATION CURRENT DENSITY; HIGH QUALITY; HIGH TEMPERATURE PROCESS; PASSIVATING LAYER; POST DEPOSITION TREATMENT; SILICON SURFACES; SINGLE LAYER; SURFACE PASSIVATION; SURFACE RECOMBINATIONS; THIN LAYERS;

EID: 79957784836     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201105188     Document Type: Article
Times cited : (102)

References (19)
  • 1
    • 50849137808 scopus 로고    scopus 로고
    • B. Hoex et al., J. Appl. Phys. 104, 044903 (2008).
    • (2008) J. Appl. Phys. , vol.104 , pp. 044903
    • Hoex, B.1
  • 2
    • 79957735317 scopus 로고    scopus 로고
    • Proc. 35th IEEE PVSC
    • J. Benick et al., Proc. 35th IEEE PVSC, 2010, p. 891.
    • (2010) , pp. 891
    • Benick, J.1
  • 4
    • 58149213837 scopus 로고    scopus 로고
    • B. Hoex et al., J. Appl. Phys. 104, 113703 (2008).
    • (2008) J. Appl. Phys. , vol.104 , pp. 113703
    • Hoex, B.1
  • 11
    • 79957722410 scopus 로고    scopus 로고
    • Proc. 25th EU PVSEC
    • A. Richter et al., Proc. 25th EU PVSEC, 2010, p. 1453.
    • (2010) , pp. 1453
    • Richter, A.1
  • 16
    • 79957724285 scopus 로고    scopus 로고
    • to be published in Energy Procedia.
    • A. Richter et al., to be published in Energy Procedia.
    • Richter, A.1
  • 17
    • 79957748830 scopus 로고    scopus 로고
    • Proc. 29th IEEE PVSC.
    • S. Dauwe et al., Proc. 29th IEEE PVSC, 2002, p. 162.
    • (2002) , pp. 162
    • Dauwe, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.