The effects of substrate bias, substrate temperature, and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering

Journal of Electronic Materials

Volumn 34, Issue 12, 2005, Pages 1484-1492

  Lee, Jyh Wei ^a   Tien, Shih Kang ^b   Kuo, Yu Chu ^a  

^a TUNG NAN INSTITUTE OF TECHNOLOGY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Chromium nitride (CrR); Pulse frequency; Pulsed direct current (dc) reactive magnetron sputtering; Substrate bias; Substrate temperature; Texture

Indexed keywords

GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MICROSTRUCTURE; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

PULSE FREQUENCY; SUBSTRATE BIAS; SUBSTRATE TEMPERATURE;

CHROMIUM COMPOUNDS;

EID: 30144442314     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-005-0155-9     Document Type: Conference Paper

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