Ion-assisted growth of Ti1-xAlxN/Ti1-yNbyN multilayers by combined cathodic-arc/magnetron-sputter deposition

Thin Solid Films

Volumn 302, Issue 1-2, 1997, Pages 179-192

  Petrov, I ^a   Losbichler, P ^a   Bergstrom, D ^a   Greene, J E ^a   Munz W D ^b   Hurkmans, T ^c   Trinh, T ^c  

^a University of Illinois at Urbana Champaign   (United States)

^b SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^c Hauzer Techno Coating BV   (Netherlands)

Author keywords

Ion bombardment; Nitrides; Sputtering

Indexed keywords

CRYSTAL MICROSTRUCTURE; EPITAXIAL GROWTH; ETCHING; FILM GROWTH; INTERFACES (MATERIALS); ION BOMBARDMENT; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; STAINLESS STEEL;

CATHODIC ARC DEPOSITION;

MULTILAYERS;

EID: 0031166807     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09524-7     Document Type: Article

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