Structural characterization of a porous low-dielectric-constant thin film with a non-uniform depth profile

Applied Physics Letters

Volumn 81, Issue 4, 2002, Pages 607-609

  Lin, Eric K ^a   Lee, Hae Jeong ^a   Lynn, Gary W ^a   Wu, Wen Li ^a   O'Neill, Mark L ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHORD LENGTHS; DENSE LAYER; DEPTH PROFILE; ELEMENTAL COMPOSITIONS; HIGH RESOLUTION; MASS DENSITIES; MULTI-LAYERED STRUCTURE; SILICON SUBSTRATES; SMALL-ANGLE NEUTRON SCATTERING; STRUCTURAL CHARACTERIZATION; WALL DENSITY; X RAY REFLECTIVITY;

DIELECTRIC MATERIALS; NEUTRON SCATTERING; POROUS SILICON; THIN FILMS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 79956042201     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1495079     Document Type: Article

References (19)

1. M. Morgen, E. T. Ryan, J. H. Zhao, C. Hu, T. Cho, and P. S. Ho, Annu. Rev. Mater. Sci. 30, 645 (2000). arm ARMSCX 0084-6600
2. T. A. Deis, C. Saha, E. Moyer, K. Chung, Y. Liu, M. Spaulding, J. Albaugh, W. Chen, and J. Bremmer, in Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics, edited by K. Maex, Y.-C. Joo, G. S. Oehrlein, S. Ogawa, and J. T. Wetzel (Materials Research Society Meeting, San Francisco, CA, 2001), Vol. 612, Paper D5.18.
3. M. L. O'Neill, L. M. Robeson, T. J. Markley, X. Gao, M. Langsam, D. A. Roberts, S. Motakef, and P. R. Sierocki, in Proceedings of the Sixteenth International VMIC Conference Santa Clara, CA, 1999, p. 92.
4. M. L. O'Neill, L. M. Robeson, W. F. Burgoyne, and M. Langsam, US Patent No. 6,187,248 (13 February 2001).
5. A. Sellinger, P. M. Weiss, A. Nguyen, Y. F. Lu, R. A. Assink, W. L. Gong, and C. J. Brinker, Nature (London) 394, 256 (1998). nat NATUAS 0028-0836
6. S. Yang, P. Mirau, C. S. Pai, O. Nalamasu, E. Reichmanis, E. K. Lin, H. J. Lee, D. W. Gidley, and J. N. Sun, Chem. Mater. 13, 2762 (2001). cma CMATEX 0897-4756
7. C. V. Nguyen, C. J. Hawker, R. D. Miller, E. Huang, J. L. Hedrick, R. Gauderon, and J. G. Hillborn, Macromolecules 33, 4281 (2000). mml MAMOBX 0024-9297
8. J. Bolze, M. Ree, H. S. Youn, S. H. Chu, and K. Char, Langmuir 17, 6683 (2001). lan LANGD5 0743-7463
9. T. L. Dull, W. E. Frieze, D. W. Gidley, J. N. Sun, and A. F. Yee, J. Phys. Chem. B 105, 4657 (2001). bfk JPCBFK 1089-5647
10. M. R. Baklanov, K. P. Mogilnikov, V. G. Polovinkin, and F. N. Dultsev, J. Vac. Sci. Technol. B 18, 1385 (2000). jvb JVTBD9 0734-211X
11. H. J. Lee, E. K. Lin, W. L. Wu, B. M. Fanconi, J. K. Lan, Y. L. Cheng, H. C. Liou, Y. L. Wang, M. S. Feng, and C. G. Chao, J. Electrochem. Soc. 148, F195 (2001). jes JESOAN 0013-4651
12. W. L. Wu, W. E. Wallace, E. K. Lin, G. W. Lynn, and C. J. Glinka, J. Appl. Phys. 87, 1193 (2000). jap JAPIAU 0021-8979
13. E. Kohdoh, M. R. Baklanov, E. K. Lin, D. W. Gidley, and A. Nakashima, Jpn. J. Appl. Phys. 40, L323 (2001). jjc JAPLD8 0021-4922
14. Certain commercial equipment and materials are identified in this paper to specify adequately the experimental procedure. In no case does such identification imply recommendation by the National Institute of Standards and Technology nor does it imply that the material or equipment is necessarily the best available for this purpose.
15. All data in the manuscript and in the figures are presented along with the standard uncertainty of the measurement.
16. L. G. Parratt, Phys. Rev. 95, 359 (1954). phr PHRVAO 0031-899X
17. H. D. Bale and P. W. Schmidt, Phys. Rev. Lett. 53, 596 (1984). prl PRLTAO 0031-9007
18. Th. Zemb in Neutron, X-ray, and Light Scattering: Introduction to an Investigative Tool for Colloidal and Polymeric Systems, edited by P. Lindner and Th. Zemb (North Holland, Amsterdam, 1991), p. 177.
19. G. Porod, Zolloid-Z. 124, 83 (1951).