Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-Simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Scholze, Frank ^a   Laubis, Christian ^a   Ulm, Gerhard ^a   Dersch, Uwe ^b   Pomplun, Jan ^c,d   Burger, Sven ^c,d   Schmidt, Frank ^c,d  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b Advanced Mask Technology Center   (Germany)

^c ZUSE INSTITUTE BERLIN   (Germany)

^d JCMWAVE GMBH   (Germany)

Author keywords

At wavelength characterization; Cd metrology; Extreme ultraviolet; Lithography; Scatterometry

Indexed keywords

AT-WAVELENGTH CHARACTERIZATION; CD-METROLOGY; CRITICAL DIMENSION; EUV MASK; EUV RADIATION; EUV REFLECTOMETER; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET MASKS; FEM CALCULATION; FEM-SIMULATION; LINE PROFILES; NUMERICAL MODELING; OPERATING REGIMES; SCATTEROMETRY; SHORT WAVELENGTHS; SIDE WALLS; SMALL FEATURES; STRUCTURAL DETAILS;

EXTREME ULTRAVIOLET LITHOGRAPHY; FINITE ELEMENT METHOD; NUMERICAL METHODS; PHOTOMASKS; UNITS OF MEASUREMENT;

PERIODIC STRUCTURES;

EID: 79959347134     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771923     Document Type: Conference Paper

References (11)

1. R. Klein, C. Laubis, R. Müller, F. Scholze, G. Ulm, "The EUV metrology program of PTB", Microelectronic Engineering 83, 707- 709 (2006).
2. F. Scholze, J. Tümmler, G. Ulm, "High-accuracy radiometry in the EUV range at the PTB soft X-ray radiometry beamline", Metrologia 40, S224-S228 (2003).
3. S. Burger, R. Klose, A. Schädle, F. Schmidt, and L. Zschiedrich, "FEM modelling of 3D photonic crystals and photonic crystal waveguides", Proc. SPIE 5728, 164-173 (2005). (Pubitemid 40954535)
4. S. Burger, R. Köhle, L. Zschiedrich, W. Gao, F. Schmidt, R. März, C. Nölscher, "Benchmark of FEM, Waveguide and FDTD Algorithms for Rigorous Mask Simulation", Proc. SPIE 5992, 599216 (2005).
5. C. Enkrich, M. Wegener, S. Linden, S. Burger, L. Zschiedrich, F. Schmidt, C. Zhou, T. Koschny, C. M. Soukoulis, "Magnetic metamaterials at telecommunication and visible frequencies", Phys. Rev. Lett. 95, 203901 (2005).
6. J. Perlich, F.-M. Kamm, J. Rau, F. Scholze, and G. Ulm "Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry", J. Vac. Sci. Technol. B 22, 3059-3062 (2004). (Pubitemid 40185070)
7. C. Laubis, et al., "Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB", Proc. SPIE 6151, 61510I (2006).
8. J. Pomplun, S. Burger, F. Schmidt, L. Zschiedrich, F. Scholze, C. Laubis, U. Dersch, "Rigorous FEM-Simulation of EUV-Masks: Influence of Shape and Material Parameters", Proc. SPIE 6349, 63493D (2006).
9. F. Scholze, C. Laubis, U. Dersch, J. Pomplun, S. Burger, and F. Schmidt, "The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks", Proc. SPIE Vol. 6617, 66171A (2007).
10. D.L. Windt, "IMD - Software for modeling the optical properties of multilayer films", COMPUTERS IN PHYSICS 12, 360-370 (1998).
11. S. Yulin, T. Feigl, T. Kuhlmann, N. Kaiser, A. I. Fedorenko, V. V. Kondratenko, O. V. Poltseva, V. A. Sevryukova, A. Yu. Zolotaryov, and E. N. Zubarev, "Interlayer transition zones in Mo/Si superlattices", J. Appl. Phys 92, 1216-1220 (2002).