Measurement traceability and quality assurance in a nanomanufacturing environment

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 1, 2011, Pages

  Orji, Ndubuisi G ^a   Dixson, Ronald G ^a   Cordes, Aaron M ^b   Bunday, Benjamin D ^b   Allgair, John A ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

^c GLOBALFOUNDRIES   (Germany)

Author keywords

measurement assurance; metrological timelines; reference measurement system; traceability

Indexed keywords

INSTRUMENT ERRORS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; QUALITY ASSURANCE; SYSTEMATIC ERRORS;

DIMENSIONAL MEASUREMENTS; FIRST-PRINCIPLES; INSTRUMENT SYSTEMATIC ERROR; MEASUREMENT TRACEABILITY; METROLOGICAL TIMELINES; NANO SCALE; NANO-MANUFACTURING; NANOSCALE DEVICE; PRODUCT MIX; REFERENCE MEASUREMENT SYSTEM; TRACEABILITY; WAFER FABRICATIONS;

MEASUREMENTS;

EID: 79955957866     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3549736     Document Type: Conference Paper

References (12)

1. N. G. Orji, R. G. Dixson, A. Martinez, B. D. Bunday, J. A. Allgair, and T. V. Vorburger, Progress on Implementation of a CD-AFM-Based Reference Measurement System., J. MicroNanolith. MEMS MOEMS 6 (2), 023002 (2007). 10.1117/1.2728742 (Pubitemid 47279537)
2. C. Croarkin, Measurement Assurance Programs: Part II: Development and Implementation; NBS Special Publication 676-11, National Bureau of Standards, Gaithersburg, MD (1985).
3. C. D. Ehrlich and S. D. Rasberry, Metrological Timelines in Traceability., Journal of Research of the National Institute of Standards and Technology 103 (1), 93-105 (1998). (Pubitemid 128612232)
4. L. Lauchlan, D. Nyyssonen, and N. Sullivan, Metrology methods in photolithography., in Handbook of Microlithography, Micromachining and Microfabrication, Vol. 1: Microlithography, P. Rai-Choudhury, Ed., pp. 475-595, SPIE Optical Engineering Press, Bellingham, WA (1997).
5. G. W. Banke and C. Archie, Characteristics of accuracy for CD metrology., Proc. SPIE 3677, 291-308 (1999). 10.1117/12.350818
6. R. Dixson, A. Guerry, M. Bennett, T. Vorburger, and B. Bunday, Implementation of a reference measurement system using CDAFM., Proc. SPIE 5038, 150-165 (2003). 10.1117/12.483667
7. R. Dixson and A. Guerry, Reference metrology using a next generation CD-AFM., Proc. SPIE 5375, 633-646 (2004). 10.1117/12.536898
8. R. G. Dixson, R. A. Allen, W. F. Guthrie, and M. W. Cresswell, Traceable calibration of critical-dimension atomic force microscope linewidth measurements with nanometer uncertainty., J. Vac. Sci. Technol. B 23, 3028-3032 (2005). 10.1116/1.2130347 (Pubitemid 41788804)
9. H. Marchman, Scanning electron microscope matching and calibration for critical dimensional metrology., J. Vac. Sci. Technol. B 15, 2155-2161 (1997). 10.1116/1.589344 (Pubitemid 127585506)
10. C. Eisenhart, Realistic evaluation of the precision and accuracy of instrument calibration systems., Journal of Research of the National Bureau of Standards, 67C 161-187 (1963).
11. H. Liu, M. Klonowski, D. Kneeburg, G. Dahlen, M. Osborn, and T. Bao, Advanced atomic force microscopy probes: Wear resistant designs., J. Vac. Sci. Technol. B 23, 3090-3093 (2005). 10.1116/1.2127936 (Pubitemid 41788817)
12. NIST/SEMATECH e-Handbook of Statistical Methods, http://www. itl.nist.gov/div898/handbook (2006).