Photoinitiators for Free Radical Polymerization Reactions

Photochemistry and Photophysics of Polymer Materials

Volumn , Issue , 2010, Pages 351-419

  Fouassier, Jean Pierre ^a   Allonas, Xavier ^a   Lalevée, Jacques ^a   Dietlin, Céline ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

Bond dissociation energy and hydrogen transfer in type II photoinitiators; Photoinitiators for free radical polymerization reactions; Photosensitizer linked photoinitiator or coinitiator based systems

Indexed keywords

EID: 79955395516     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9780470594179.ch10     Document Type: Chapter

References (355)

1. C.G. Roffey, Photopolymerization of Surface Coatings, JohnWiley&Sons, Inc., New York, 1982.
2. J.F. Rabek, Mechanisms of Photophysical and Photochemical Reactions in Polymer: Theory and Practical Applications, Wiley, New York, 1987.
3. C.E. Hoyle and J.F. Kinstle (Eds.),Radiation Curing of Polymeric Materials, ACS Symposium Series, 417, 1990.
4. J.P. Fouassier and J.F. Rabek (Eds.),Lasers in Polymer Science and Technology: Applications, CRC Press, Boca Raton, 1990.
5. H. Bottcher, Technical Applications of Photochemistry, DeutscherVerlag fur grundstoffindustrie, Leipzig, 1991.
6. S.P. Pappas, UV-Curing: Science and Technology, Tech Mark Corporation, Stamford, 1986, Plenum Press, New York, 1992.
7. J.P. Fouassier and J.F. Rabek (Eds.),Radiation Curing in Polymer Science and Technology, Chapman & Hall, London, 1993.
8. V. Krongauz and A. Trifunac (Eds.),Photoresponsive Polymers, Chapman and Hall, New York, 1994.
9. J.P. Fouassier, Photoinitiation, Photopolymerization, Photocuring, Hanser, Münich, 1995.
10. N.S. Allen, M. Edge, I.R. Bellobono, and E. Selli (Eds.),Current Trends in Polymer Photochemistry, Ellis Horwood, New York, 1995.
11. A. B. Scranton, A. Bowman, and R.W. Peiffer (Eds.),Photopolymerization: Fundamentals and Applications, ACS Symposium Series 673,Washington DC, 1997.
12. Chemistry & Technology of UV & EB Formulation for Coatings, Inks and Paints, K.T. Olldring Ed., John Wiley and Sita, Vol. I-VIII, London, 1997.
13. J.P. Fouassier, Photoinitiated Polymerization: Theory and Applications, Rapra Review Reports, 9, 4, Rapra Tech. Ltd, Shawbury, 1998.
14. R. Holman (Ed.), UV and EB Chemistry, Sita Technology Ltd, London, 1999.
15. S. Davidson, Exploring the Science, Technology and Application ofUV and EB Curing, Sita Technology Ltd, London, 1999.
16. D.C. Neckers, UV and EB at the Millenium, Sita Technology Ltd, London, 1999.
17. J.P. Fouassier (Ed.), Photosensitive Systems for Photopolymerization Reactions, Trends in Photochemistry and Photobiology, Vol. 5, Research Trends, Trivandrum, India, 1999.
18. J.P. Fouassier, Light Induced Polymerization Reactions, Trends in Photochemistry and Photobiology, Vol. 7, Research Trends, Trivandrum India, 2001.
19. K. Dietliker, A Compilation of Photoinitiators Commercially Available for UV Today, Sita Technology Ltd, London, 2002.
20. J.G. Drobny, Radiation Technology for Polymers, CRC Press LLC, Boca Raton, 2003.
21. K.D. Belfied and J.V. Crivello (Eds.),Photoinitiated Polymerization, ACS Symposium Series 847, Washington, DC, 2003.
22. J. P. Fouassier (Ed.), Photochemistry and UV Curing, Research Signpost, Trivandrum, India, 2006.
23. R. Schwalm, UV Coatings: Basics, Recent Developments and New Applications, Elsevier, Oxford, UK, 2007.
24. J.P. Fouassier, Rec. Res. Dev. Photochem. Photobiol. 2000, 4, 51-74.
25. J.P. Fouassier, Curr. Trends Polym. Sci. 1999. 4.
26. J.P. Fouassier, Rec. Res. Dev. Polym. Sci. 2000, 4, 131-145.
27. J.P. Fouassier,X. Allonas, and D. Burget, Progr. Org. Coat. 2003, 47, 16-36,
28. W. Schnabel,in: J.P. Fouassier and J.F. Rabek (Eds.),Lasers in Polymer Science and Technology, Vol. II, CRC Press, Boca Raton, 2000.
29. T. Urano, J. Photopolym. Sci. Tech. 2003, 16(1), 129-156.
30. J.P. Fouassier, X. Allonas, and D. Burget, Progr. Org. Coat. 2003, 47, 16-36.
31. J.P. Fouassier, D. Ruhlmann, B. Graff, F. Morlet-Savary, and F.Wieder, Progr. Org. Coat. 1995, 25, 235-271.
32. J.P. Fouassier,D. Ruhlmann, B. Graff, and F.Wieder, Progr. Org. Coat. 1995, 25, 169-202.
33. J.P. Fouassier, Progr. Org. Coat. 1990, 18, 229-252.
34. A.F. Cunningham and V. Desobry, in: J.P. Fouassier (Ed.), Radiation Curing in Polymer Science and Technology, Elsevier, Barking, UK, 1993.
35. W.A. Green and A.W. Timms, in: J.P. Fouassier (Ed.), Radiation Curing in Polymer Science and Technology, Elsevier, Barking, UK, 1993.
36. J. P. Fouassier, X. Allonas, and J. Lalevée,in: K. Matyjaszewski, Y. Gnanou, and L. Leibler (Eds.),Macromolecular Engineering: From Precise Macromolecular Synthesis to Macroscopic Materials Properties and Applications, Vol. 1, Wiley-VCH, Weinheim, 2007, pp. 643-672.
37. A.N. Savitsky, H. Paul, and A.I. Shushin, Helv. Chim. Acta, 2006, 89(10), 2533-2543.
38. K. Sirovatka Padon and A.B. Scranton, J. Polym. Sci. A Polym. Chem. 2000, 38(18), 3336-3346.
39. V. Lemée, D. Burget, P. Jacques, and J.P. Fouassier, J. Polym. Sci. A Polym. Chem. 2000, 38(10), 1785-1794.
40. J.P. Fouassier, D. Ruhlmann, and A. Erddalane, Macromolecules 1993, 26(4), 721-728.
41. M. Dossot, H. Obeid, X. Allonas, P. Jacques, J.P. Fouassier, and A. Merlin, J. Appl. Polym. Sci. 2004, 92(2), 1154-1164.
42. A. Valdehenito, E.A. Lissi, and M.V. Encinas, Macromol. Chem. Phys. 2001, 202(12), 2581-2585.
43. I. Morino, M. Wakasa, and H. Hayashi, Mol. Phys. 2002, 100(9), 1283-1289.
44. I. Capek, Trends Photochem. Photobiol. 2001, 7, 147-157.
45. R.P. Wayne, Principles and Applications of Photochemistry, Oxford Science and Publications, Oxford, 1988.
46. N.J. Turro, Modern Molecular Photochemistry, Benjamin, New York, 1978, re-edited in 1990.
47. A. Gilbert, J. Baggot, Essentials of MolecularPhotochemistry, BlackwellScientific Publications, Oxford, 1991.
48. P. Suppan, Chemistry and Light, The Royal Society of Chemistry, 1994.
49. A. Braun, M.T. Maurette, and E. Oliveros, Technologie Photochimique, Presses Polytechniques Romandes, Lausanne, 1986.
50. H.A. Gour, C.J. Groenenboom, H.J. Hageman, G.T.M. Hakwoort, P. Osterholl, T. Overeem, R.I. Polman, and S. Van des Werf, Makromol. Chem. 1984, 185, 1795.
51. P. Jaegermann, F. Lendzian, G. Rist, and K. Mobius, Chem.hys. Lett. 1987, 140(6), 615-619.
52. W.U. Palm and H. Dreeskamp, J. Photochem. 1990, 52(3), 439-450.
53. J.E. Christensen, A.F. Jacobine, and C.J.V. Scaiano, Radiat. Curing 1981, 8(3), 1.
54. J. Eichler, C.P. Herz, I. Naito, and W. Schnabel, J. Photochem. 1980, 12(3), 225-234.
55. S. Jockusch, M.S. Landis, B. Freiermuth, and N.J. Turro, Macromolecules 2001, 34(6), 1619-1626.
56. R. Liskra, Heterocycles 2001, 55(8), 1475-1486.
57. R. Liskra and D. Herzog, J. Polym. Sci. A Polym. Chem. 2004, 42(3), 752-764.
58. R. Liskra, B. Seidl, and G. Grabner, Polym. Preprints 2004, 45(2), 75-76.
59. R. Liska, in: J.P. Fouassier (Ed.), Photochemistry and UV Curing: New Trends, Research Signpost, Trivandrum, India, 2006.
60. R. Liska and B. Seidl, J. Polym. Sci. A Polym. Chem. 2005, 43(1), 101-111.
61. C.G. Groenenboom, H.J. Hageman, P. Oosterhoff, T. Overeem, and J. Verbeek, J. Photochem. Photobiol. A Chem. 1997, 107(1-3), 261-269.
62. H.J. Hageman, P. Oosterhoff, and J. Verbeek, J. Photochem. Photobiol. A Chem. 1999, 121 (3), 207-211.
63. R. Mallavia, R. Sastre, and F. Amat-Guerri, J. Photochem. Photobiol. A Chem. 1999, 138, 207.
64. T. Sumiyoshi, W. Schnabel, and A. Henne, J. Photochem. 1986, 32(2), 191-201.
65. J.E. Baxter, R.S. Davidson, and H.J. Hageman, Polymer 1988, 29(9), 1569-1574.
66. S. Jockusch, I.V. Koptyug, P.F. McGarry, G.W. Sluggett, N.J. Turro, and D.M. Watkins, J. Am. Chem. Soc. 1997, 119(47), 11495-11501.
67. V. Desobry, K. Dietliker, R. Husler, L. Misev, M. Rembold, G. Rist, and W. Rutsch, in: C.E. Hoyle, and J.F. Kinstle (Eds.),ACS Symposium Serires 247,Washington, 1989.
68. M. Yamaji, S. Wakabayashi, and S. Tobita, Res. on Chem. Intermed., 2006, 32 (8),749-758.
69. J.P. Fouassier and D.J. Lougnot, Polymer Commun. 1990, 31, 418-421.
70. E. Andrzejewska, Trends Photochem. Photobiol. 2001, 7, 1-9.
71. J.P. Fouassier, D.J. Lougnot, and L. Avar, Polymer 1995, 36(26), 5005-5010.
72. J.P. Fouassier, D.J. Lougnot, and J.C. Scaiano, Chem.Phys. Lett. 1989, 160, 335-340.
73. J.P. Fouassier, V. Lemée, A. Espanet, D. Burget, F. Morlet-Savary, P. Di Battista, and G. Li Bassi, Eur. Polym. J. 1997, 33(6), 881-896.
74. G. Li Bassi, L. Cadona, and F. Broggi, Radcure 86, Tech. Paper 4-27,SMEEd., Dearborn, Michigan, 1986.
75. M. Cattaneonti, Proc. Rad. Tech. 2002, 2002, p. 403.
76. X. Allonas, C. Grotzinger, J. Lalevée, J.P. Fouassier, and M.Visconti, Eur. Polym. J. 2001, 37, 897-906.
77. H.J. Hageman and P. Oosterhoff, Macromol. Chem. Phys. 2000, 201(14), 1687-1690.
78. J.P. Fouassier and D. Burr, Macromolecules 1990, 23, 3615-3619.
79. G. Berner, G. Rist, W. Rutsch, and R. Kirchmayer, Radcure Basel, Technical Paper FC85-446, SME, Dearborn, Michigan, 1985.
80. H. Tomioka, Y. Takimoto, M. Kawabata, M. Harada, J.P. Fouassier, and D. Ruhlmann, J. Photochem. Photobiol. A Chem. 1990, 53, 359-372.
81. F. Morlet-Savary, J.P. Fouassier, and H. Tomioka, Polymer 1992, 33(19), 4202-4206.
82. G. Berner, R. Kirchmayer, and G. Rist, J. Oil. Chem. Assoc. 1978, 61, 105.
83. J.H. Kim and H.L. Kim, Chem.hys. Lett. 2001, 333(1,2), 45-50.
84. K. Kawamura, Chem. Lett. 2003, 32(9), 832-833.
85. M. Buback, M. Kling, S. Schmatz, and J. Schroeder, Phys. Chem. Chem. Phys. 2004, 6(24), 5441-5455.
86. A.V. Fedorov, E.O. Danilov, M.A.J. Rodgers, and D. C. Neckers, J. Am. Chem. Soc. 2001, 123(21), 5136-5137.
87. N.Yasuda, S.Yamamoto,Y.Wada, and S.Yanagida, J. Polym. Sci. A Polym. Chem. 2001, 39(24), 4196-4205.
88. M.-L. Tsao and M.S. Platz, J. Phys. Chem. A 2004, 37(24), 8984-8991.
89. J. Alvarez, M.V. Encinas, and E.A. Lissi, Macromol. Chem. Phys. 1999, 200(10), 2411-2415.
90. W. Sander, A. Strehl, and M. Winkler, Eur. J. Org. Chem. 2001, 20, 3771-3778.
91. S.-R. Baruah and D.K. Kakati, J. Appl. Polym. Sci. 2006, 100(2), 1601-1606.
92. J. Lalevee, M. El Roz, F. Morlet-Savary, B. Graff, X. Allonas, and J.P. Fouassier, Macromolecules 2007, 40, 8527-8530 .
93. T.S. Kwon, K. Suzuki, K. Takagi, H. Kunisada, and Y. Yuki, J. Macromol. Sci. Pure Appl. Chem. 2001, A38(5-6), 591-604.
94. N.S. Allen, S.J. Hardy, A.F. Jacobine, D.M. Glaser, B. Yang, D. Wolf, F. Catalina, S. Navaratnam, and B.J. Parsons, J. Appl. Polym. Sci. 1991, 42(5), 1169.
95. D.C. Neckers, I.I. Abu Abdoun, and L. Thijs, Macromolecules 1984, 17(3), 282-288.
96. B.K. Shah and D.C. Neckers, J. Amer. Chem. Soc. 2004, 126(6), 1830-1835.
97. B.K. Shah, A. Gusev, M.A.J. Rodgers, and D.C. Neckers, J. Phys. Chem. A 2004, 108(28), 5926-5931.
98. F. Morlet-Savary, F. Wieder, and J.P. Fouassier, J. Chem. Soc. Faraday Trans. 1997, 93(22), 3931-3937.
99. D.H.R. Barton and S.Z. Zard, Pure Appl. Chem. 1986, 58(5), 675-684.
100. B.C. Bales, J.H. Horner, X. Hueng, M. Newcomb, D. Crich, and M.M. Greenberg, J. Am. Chem. Soc. 2001, 123(16), 3623-3629.
101. M. Newcomb, J.H. Horner, P.O. Whitted, D. Crich, X. Huang, Q.Yao, and H. Zipse, J. Am. Chem. Soc. 1999, 121(46), 10685-10694.
102. B.M. Aveline, I.E. Kochevar, and R.W. Redmond, J. Am. Chem. Soc. 1996, 118(42), 10113-10123.
103. C. Dietlin, X. Allonas, F. Morlet-Savary, J.P. Fouassier, M. Visconti, G. Norcini, and S. Romagnano, J. App. Polym. Sci. 2008, 109, 828-833.
104. M.M. Alam, M. Fujitsuka, and O. Ito, Rec. Res. Dev. Phys. Chem. 2000, 4, 369.
105. C. Bohne, R. Boch, and J.C. Scaiano, J. Org. Chem. 1990, 55(19), 5414-5418.
106. M. Newcomb, J.H. Horner, P.O. Whitted, D. Crich, X. Huang, Q.Yao, and H. Zipse, J. Am. Chem. Soc. 1999, 121(46), 10685-10694.
107. O. Grinevich, P. Serguievski, A.M. Sarker, W. Zhang, A. Mejiritski, and D.C. Neckers, Macromolecules 1999, 32(2), 328-330.
108. A.M. Sarker, K. Sawabe, B. Strehmel, Y. Kaneko, and D.C. Neckers, Macromolecules ACS ASAP 1999, 32(16), 5203-5209.
109. J. Kabatc, B. Jedrzejewska, and J. Paczkowski, J. Polym. Sci. A Polym. Chem. 2003, 41(19), 3017-3026.
110. J. Kabatc, M. Pietrzak, and J. Paczkowski, J. Chem. Soc. Perkin Trans. 2002, 2(2), 287-295.
111. B. Jedrzejewska, J. Kabatc, M. Pietrzak, and J. Paczkowski, J. Polym. Sci. A Polym. Chem. 2002, 40(10), 1433-1440.
112. T. Sato, T. Katayose, and M. Seno, J. Appl. Polym. Sci. 2000, 79(1), 166-175.
113. C.R. Rivarola, S.G. Bertolotti, and C.M. Previtali, J. Polym. Sci. A Polym. Chem. 2001, 39(24), 4265-4273.
114. M.G. Neumann, C.C. Schmitt, and I.C. Rigoli, J. Photochem. Photobiol. A Chem. 2003, 159, 145-150.
115. C. Billaud, M. Sarakha, and M. Bolte, J. Polym. Sci. A Polym. Chem. 2000, 38(21), 3997-4005.
116. J. Jakubiak and J.F. Rabek, Polimery 1999, 44, 447-461.
117. R.Jantas,T.Wodka,andG.Janowska,Polimery(Warsaw,Poland)2001,46(11-12),812-816.
118. M. Degirmenci, I. Cianga, and Y. Yagci, Macromol. Chem. Phys. 2002, 203(10-11), 1279-1284.
119. M. Degirmenci, G. Hizal, and Y. Yagci, Macromolecules 2002, 35(22), 8265-8270.
120. T. Corrales, F. Catalina, C. Peinado, and N.S. Allen, J. Photochem. Photobiol. A Chem. 2003, 159, 103-114.
121. J.P. Fouassier, D.J. Lougnot, G. Li Bassi, and C. Nicora, Polym Commun. 1989, 30, 245-248.
122. L. Angiolini, D. Caretti, and E. Salatelli, Macromol. Chem. Phys. 2000, 201(18), 2646-2653.
123. V. Castelvetro, M. Molesti, and P. Rolla, Macromol. Chem. Phys. 2002, 203(10/11), 1486-1496.
124. Z. Liu, M.Weber, N.J. Turro, and B. O'Shaughnessy, Polym. Prepr. Am. Chem. Soc. Div. Polym. Chem. 2001, 42(2), 771-772.
125. M. Visconti, in: J.P. Fouassier (Ed.), Photochemistry and UV Curing: New Trends, Research Signpost, Trivandrum, India, 2006, p. 153.
126. C. Dietlin, J. Lalevée, X. Allonas, J.P. Fouassier,M. Visconti, G. Li Bassi, and G. Norcini, J. App. Polym. Sci. 2008, 107, 246-252.
127. W.D. Davies, F.D. Jones, J. Garrett, I. Hutchison, and G. Walton, Surf. Coat. Int., 2000, 83(2),72-78.
128. W.D. Davies, F.D. Jones, J. Garrett, I. Hutchinson, and G.Walton, Surf. Coat. Int. B Coat. Trans. 2001, 84(B3), 213-222.
129. M. Visconti and M. Cattaneo, Prog. Org. Coat., 2000, 40(1-4), 243-251.
130. G. Ullrich, B. Ganster, U. Salz, N. Moszner, and R. Liska, J. Polym. Sci. A Polym. Chem. 2006, 44(5), 1686-1700.
131. J.H. de Groot, K. Dillingham, H. Deuring, H.J. Haitjema, F.J. van Beijma, K. Hodd, and S. Norrby, Biomacromolecules 2001, 2(4), 1271-1278.
132. R. Liska, J. Polym. Sci. A Polym. Chem. 2002, 40(10), 1504-1518.
133. J.P. Fouassier, D. Burr, and F.Wieder, J. Polym. Sci.APolym.Chem. 1991, 29, 1319-1327.
134. K. Vacek, J. Geimer, D. Beckert, and R. Mehnert, J. Chem. Soc. Perkin Trans. 1999, 2 (11), 2469-2471.
135. T. Otsu and T. Taraki, Polym. Bull. 1986, 16(4), 277-284.
136. D. Bertin, B. Boutevin, P. Gramain, J.M. Fabre, and C. Montginoul, Eur. Polym. J. 1998, 34(1), 85-90.
137. A. Ajayaghosh and R. Francis, J. Am. Chem. Soc. 1999, 121(28), 6599-6606.
138. S.H. Qin, D.Q. Qin, and K.Y. Qiu, Chinese J. Polym. Sci. 2001, 19(5), 441-445.
139. K. Rathore, K.R. Reddy, N.S. Tomer, S.M. Desai, R.P. Singh, J. Appl. Polym. Sci. 2004, 93(1),348-355.
140. S.H. Qin and K.Y. Qiu, Eur. Polym. J. 2001, 37(4), 711-717.
141. J. Lalevée, M. El Roz, X. Allonas, and J.P. Fouassier, J. Polym. Sci. 2007, 45, 2436-2442.
142. J. Lalevée, X. Allonas, and J.P. Fouassier, Macromolecules 2006, 39, 8216-8218.
143. Y. Tian, M. Zhang, X. Yu, G. Xu, Y. Ren, J. Yang, J.Wu, X. Zhang, X. Tao, S. Zhang, and M. Jiang, Chem.hys. Lett. 2004, 388(4-6), 325-329.
144. Y. Yan, X. Tao, Y. Sun, G. Xu, C. Wang, J. Yang, X. Zhao, Y. Wu, Y. Ren, X. Yu, and M. Jiang, Mater. Sci. Eng. B 2004, 113(2), 170-174.
145. Y. Yan, X. Tao, Y. Sun, W. Yu, C. Wang, G. Xu, J. Yang, Y. Wu, X. Zhao, and M. Jiang, J. Mol. Struct. 2004, 733(1-3), 83-87.
146. Y. Boiko, J. Non linear Opt. Phys. Mater. 2005, 14(1), 79-84.
147. Z.-L. Huang, N. Li,Y.-F. Sun, H.-Z.Wang, H.-C. Song, and Z.-L. Xu, J. Mol. Struct. 2003, 657(1-3), 343-350.
148. G.Y. Zhou, D.Wang, Y.P. Tian, Z.S. Shao, and M.H. Jiang, Appl. Phys. B 2004, 78(3-4), 397-400.
149. H. Tomioka, N. Takase, Y. Maeyama, K. Hida, V. Lemée, J.P. Fouassier, and D. Burget, Res. Chem. Intermed. 2001, 27(1,2), 47-59.
150. P.K. Bhuyan and D.K. Kakati, J. Appl. Polym. Sci. 2005, 98(5), 2320-2328.
151. C. Ma, M.G. Steinmetz, E.J. Kopatz, and R. Rathore, J. Org. Chem. 2005, 70(11), 4431-4442.
152. L. Macarie, I. Manoviciu, V. Manoviciu, G. Dehelean, G. Ilia, S. Iliescu, A. Popa, and N. Plesu, Revista de Chimie (Bucharest, Romania) 2002, 53(7), 568-571.
153. S. Daswal and A. Mishra, J. Appl. Polym. Sci. 2006, 99(3), 920-926.
154. K. Sakayori, Y. Shibasaki, and M. Ueda, J. Polym. Sci. A Polym. Chem. 2005, 43(22), 5571-5580.
155. K. Tanaka, R. Akimoto, T. Igarashi, and T. Sakurai, J. Polym. Sci. A Polym. Chem. 2006, 44(1), 25-31.
156. V.V. Semenov, E.Y. Ladilina, N.F. Cherepennikova, and T.A. Chesnokova, Russ. J. Appl. Chem. 2002, 75(1), 127-134.
157. R.E. Medsker, A. Sebenik, and H.J. Harwood, Polym. Bull. Berlin, Germany), 2002, 48(1), 17-23.
158. H.J. Hageman, J. Photochem. Photobiol. A Chem. 1998, 117(3), 235-238.
159. J. Paczkowski, Z. Kucybala, F. Scigalski, and A. Wrzyszczynski, J. Photochem. Photobiol. A Chem. 2003, 159, 115-125.
160. R. Liska, S. Knaus, H. Gruber, and J.Wendrinsky, Surf. Coat. Int. 2000, 83(6), 297-303.
161. D. Anderson, Procedings of the Radtech Europe Conference 435-444,Vincentz Network, Hannover, 2005.
162. N.S. Allen, M.C. Marin, M. Edge, D.W. Davies, J. Garrett, and F. Jones, Polym. Degrad. Stab. 2001, 73(1), 119-139.
163. M.A. Tasdelen, B. Kiskan, and Y. Yagci, Macromol. Rapid Commun. 2006, 27(18), 1539-1544.
164. J. Lalevée, X. Allonas, and J.P. Fouassier, J. Org. Chem. 2007, 72, 6434-6439.
165. J. Lalevée, A. Dirani, M. El Roz, X. Allonas, and J.P. Fouassier, Macromolecules 2008, 41, 2003-2010.
166. Q. Wu and B. Qu, Polym. Eng. Sci. 2001, 41(7), 1220-1226.
167. K. Viswanathan, C.E. Hoyle, E.S. Joensson, C. Nason, and K. Lindgren, Macromolecules 2002, 35(21), 7963-7967.
168. C. Valderas, S. Bertolotti, C.M. Previtali, and M.V. Encinas, J. Polym. Sci. A Polym. Chem. 2002, 40(16), 2888-2893.
169. J. Paczkowski and D.C. Neckers, Electron Transf. Chem. 2001, 5, 516-585.
170. J. Kabatc, B. Jedrzejewska, and J. Paczkowski, Macromol. Mater. Eng. 2006, 291(6), 646-654.
171. E. Andrzejewska, D. Zych-Tomkowiak, M.B. Bogacki, and M. Andrzejewski, Macromolecules 2004, 37(17), 6346-6354.
172. E. Andrzejewska, D. Zych-Tomkowiak, M. Andrzejewski, G.L. Hug, and B. Marciniak, Macromolecules 2006, 93(11), 3777-3785.
173. J. Lalevée, X. Allonas, L. Zadoina, and J.P. Fouassier, J. Polym. Sci. Polym. Chem. 2007, 45, 2494-2502.
174. E. Andrjewska, in: J.P. Fouassier, Photochemistry and UV Curing: New Trends, Research Signpost, Trivandrum, India, 2006, p. 127.
175. F. Scigalski and J. Paczkowski, J. Appl. Polym. Sci. 2005, 97(1), 358-365.
176. G. Ullrich, P. Burtscher,U. Salz, N. Moszner, and R. Liska, J. Polym. Sci. A Polym. Chem. 2006, 44(1), 115-125.
177. J.R. Woodward, T.S. Lin, Y. Sakaguchi, and H. Hayashi, Mol. Phys. 2002, 100(8), 1235-1244.
178. X. Cai, M. Sakamoto, M. Hara, A. Sugimoto, S. Tojo, K. Kawai, M. Endo, M. Fujitsuka, and T. Majima, Photochem. Photobiol. Sci. 2003, 2(11), 1209-1214.
179. X. Cai, M. Sakamoto, M. Fujitsuka, and T. Majima, Chem. Eur. J. 2005, 11(22), 6471-6477.
180. D.K. Palit, Res. Chem. Intermed. 2005, 31(1-3), 205-225.
181. T. Corrales, C. Peinado, F. Catalina, M.G. Neumann, N.S. Allen, A.M. Rufs, and M.V. Encinas, Polymer 2000, 41(26), 9103-9109.
182. M.V. Encinas, A.M. Rufs, T. Corrales, F. Catalina, C. Peinado, K. Schmith, M.G. Neumann, and N.S. Allen, Polymer 2002, 43(14), 3909-3913.
183. C. Ley, F. Morlet-Savary, P. Jacques, and J.P. Fouassier, Chem.hys. 2000, 255, 335-346.
184. X. Allonas, C. Ley, C. Bibaut, P. Jacques, and J.P. Fouassier, Chem.hys. Lett. 2000, 322, 483-490.
185. M. Shah, N.S. Allen, M. Edge, S. Navaratnam, and F. Catalina, J. Appl. Polym. Sci. 1996, 62(2), 319-340.
186. I. Pyszka, Z. Kucybala, and J. Paczkowski, Macromol. Chem. Phys. 2004, 205(17), 2371-2375.
187. J. Nie, L.A. Linden, J.F. Rabek, J.P. Fouassier, F. Morlet-Savary, F. Scigalski, A. Wrzyszczynski, and E. Andrzejewska, Acta Polym. 1998, 49, 145-161.
188. J. Nie, E. Andrzejewska, J.F. Rabek, L.A. Linden, J.P. Fouassier, J. Paczkowski, F. Scigalski, and A. Wrzyszczynski, Macromol. Chem. Phys. 1999, 200, 1692-1701.
189. X. Allonas, J.P. Fouassier, L. Angiolini, and D. Caretti, Helv. Chim. Acta 2001, 84, 2577-2588.
190. J.P. Fouassier, S.K. Wu, J. Appl. Polym. Sci. 1992, 44, 1779-1786.
191. C. Ley, F. Morlet-Savary, J.P. Fouassier, and P. Jacques, J. Photochem. Photobiol. 2000, 137, 87-92.
192. T. Okutsu, M. Ooyama, H. Hiratsuka, J. Tsuchiya, and K. Obi, J. Phys. Chem. A 1999, 104(2),288-292.
193. H.Wang, J.Wei, X. Jiang, and J.Yin, Macromol. Chem. Phys. 2006, 207(12), 1080-1086.
194. R. Nagarajan, J.S. BowersJr., Z. Wu, H. Cui, R. Bao, S. Jonsson, R. McCartney, C.U. PittmanJr., L. Cao, and R. Ran, Surf. Coat. Int. 1999, 82(7), 344-347.
195. H.Wang,Y. Shi, J.Wei,X. Jiang, and J.Yin, J. Appl. Polym. Sci. 2006, 101(4), 2347-2354.
196. N.S. Allen, N.G. Salleh, M. Edge, M. Shah, C. Ley, F. Morlet-Savary, J.P. Fouassier, F. Catalina, A. Green, S. Navaratnam, and B.J. Parsons, Polymer 1999, 40, 4181-4193.
197. C. Grotzinger, D. Burget, J.P. Fouassier, G. Rirchard, O. Primel, and S. Yean, Procedings of the RadTech USA International Conference, 2006.
198. J.P. Malval, C. Dietlin, X. Allonas, and J.P. Fouassier, J. Photochem. Photobiol., in press.
199. T. Corrales, F. Catalina, N.S. Allen, and C. Peinado,in: J.P. Fouassier (Ed.), Photochemistry and UV Curing: New trends, Research Signpost, Trivandrum, India, 2006, p. 31.
200. L. Cokbaglan, N. Arsu, Y. Yagci, S. Jockusch, and N.J. Turro, Macromolecules 2003, 36(8), 2649-2653.
201. M. Aydin, N. Arsu, and Y. Yagci, Macromol. Rapid Commun. 2003, 24(12), 718-723.
202. M. Aydin, N. Arsu, Y. Yagci, S. Jockusch, and N.J. Turro, Macromolecules 2005, 38(10), 4133-4138.
203. G. Ullrich, D. Herzog, R. Liskra, P. Burtscher, and N. Moszner, J. Polym. Sci. A Polym. Chem. 2004, 42(19), 4948-4963.
204. H. Kura, H. Oka, M. Ohwa, T. Matsumura, A. Kimura, Y. Iwasaki, T. Ohno, M. Matsumura, and H. Murai, J. Polym. Sci. B Polym. Phys. 2005, 43(13), 1684-1695.
205. M.A. Tasdelen,V.Kumbaraci,N.Talinli, andY.Yagci, Polymer 2006, 47(22), 7611-7614.
206. E. Novikova, A. Kolendo, V. Syromyatnikov, L. Avramenko, T. Prot, and K. Golec, Polimery (Warsaw, Poland), 2001, 46(6), 406-413.
207. V. Wintgens, J.C. Netto-Ferreira, and J.C. Scaiano, Photochem. Photobiol. Sci. 2002, 1 (3), 184-189.
208. A. Costela, I. Garcia-Moreno, J. Dabrio, and R. Sastre, J. Polym. Sci. A Polym. Chem. 1997, 35(17), 3801-3812.
209. M.V. Encinas, A.M. Rufs, E. Norambuena, and C. Giannotti, J. Polym. Sci. A Polym. Chem. 2000, 38(12), 2269-2273.
210. A. Costela, I. Garcia-Moreno, O. Garcia, and R. Sastre, Chem.hys. Lett. 2001, 347 (1,2,3), 115-120.
211. F. Bertens, Y. Qingjin, and D. Gu, Procedings of the RadTech Europe 2005, 1, 471-478.
212. T. Corrales, F. Catalina, C. Peinado, N.S. Allen, A.M. Rufs, C. Bueno, M.V. Encinas, Polymer 2002, 43(17), 4591-4597.
213. X. Jiang, H. Xu, and J. Yin, Polymer 2003, 45(1), 133-140.
214. X. Jiang and J. Yie, Macromol. Rapid Commun. 2004, 25(6), 748-752.
215. X. Jiang and J. Yin, J. Appl. Polym. Sci 2004, 94(6), 2395-2400.
216. J.Wei, H.Wang, X. Jiang, and J.Yin, Macromol. Chem. Phys. 2006, 207(19), 1752-1763.
217. J.P. Fouassier, D. Ruhlmann, K. Zahouily, L. Angiolini, C. Carlini, and N. Lelli, Polymer 1992, 33(17), 3569-3573.
218. L. Pouliquen, X. Coqueret, F. Morlet-Savary, and J.P. Fouassier, Macromolecules 1995, 28(24), 8028-8034.
219. J. Wei, H. Wang, X. Jiang, and J. Yin, Macromol. Chem. Phys. 2007, 208(3), 287-294.
220. J. Wei, H. Wang, and J. Yin, J. Polym. Sci. A Polym. Chem. 2007, 45(4), 576-587.
221. H. Wang, J. Wei, X. Jiang, and J. Yin, Polym. Int. 2007, 56(2), 200-207.
222. D.J. Lougnot and J.P. Fouassier, in: J.P. Fouassier and J.F. Rabek (Eds.),Lasers in Polymer Science and Technology: Applications, CRC. Press, Boca Raton, 1990.
223. D.J. Lougnot, C. Turck, and J.P. Fouassier, Macromolecules 1989, 22, 108-116.
224. F. Catalina, C. Peinado, M. Blanco, N.S. Allen, T. Corrales, and I. Lukac, Polymer 1998, 39(18), 4399-4408.
225. T. Corales, F. Catalina, N.S. Allen, and C. Peinado, J. Photochem. Photobiol. A Chem. 2005, 169(1), 95-100.
226. K. Belfield, Procedings of the Radtech Europe Conference, 2, 75-82, Vincentz Network, Hannover, 2005.
227. C. Heller, N. Pucher, B. Seidl, K.R. Kalinyaprak, G. Ullrich, L. Kuna, V. Satzinger, V. Schmidt, L. Lichtenegger, J. Stampfl, and R. Liska, J. Polym. Sci. A Polym. Chem. 2007.
228. C.K. Nguyen, R.S. Smith, T.B. Cavitt, C.E. Hoyle, S. Jonsson, C.W. Miller, and S.P. Pappas, Polym. Prepr. 2001, 42(2), 707-708.
229. H. Wang, J. Wei, X. Jiang, and J. Yin, Polym. Int. 2006, 55(8), 930-937.
230. E.S. Jonsson and C.E. Hoyle,in: J.P. Fouassier (Ed.), Photochemistry and UV Curing: New Trends, Research Signpost, Trivandrum, India, 165, 2006.
231. Y. Bi and D.C. Neckers, J. Photochem. Photobiol. A Chem. 1993, 74, 221-228.
232. R. Mallavia, F. Amat-Guerri, A. Fimia, and R. Sastre, Macromolecules 1994, 27(9), 2643-2646.
233. S.G. Bertolotti, C.M. Previtali, A.M. Rufs, and M.V. Encinas, Macromolecules 1999, 32(9), 2920-2924.
234. M.V. Encinas, A.M. Rufs, S. Bertolotti, and C.M. Previtali, Macromolecules 2001, 34(9), 2845-2847.
235. L. Villegas, M.V. Encinas, A.M. Rufs, C. Bueno, S. Bertolotti, and C.M. Previtali, J. Polym. Sci. A Polym. Chem. 2001, 39(23), 4074-4082.
236. O. Garcia, A. Costela, I. Garcia-Moreno, and R. Sastre, Macromol. Chem. Phys. 2003, 204(18), 2233-2239.
237. H. Yong,W. Zhou, G. Liu, L.M. Zhen, and E.Wang, J. Photopolym. Sci. Technol. 2000, 13(2), 253-258.
238. M.G. Neumann, C.C. Schmitt, and B.E. Goi, J. Photochem. Photobiol. A Chem. 2005, 174(3), 239-245.
239. H.J. Timpe, S. Ulrich, C. Decker, and J.P. Fouassier, Macromolecules 1993, 26, 4560-4566.
240. D. Burget, C. Mallein, and J.P. Fouassier, Polymer 2003, 44(25), 7671-7678.
241. D. Burget, C. Mallein, and J.P. Fouassier, Polymer 2004, 45, 6561-6567.
242. F. Mauguiere-Guyonnet, D. Burget, and J.P. Fouassier, Prog. Org. Coat. 2006, 57, 23-32.
243. M. Bendyk, B. Jedrzejewska, J. Paczkowski, and L.-A. Linden, Polimery (Warsaw, Poland), 2002, 47(9), 654-656.
244. Y.-T. Shi, J. Yin, M. Kaji, and H. Yori, Polym. Int. 2006, 55(3), 330-339.
245. Y. Shi, J. Yin, M. Kaji, and H. Yori, Polym. Eng. Sci. 2006, 46(4), 474-479.
246. X. Allonas, H. Obeid, J.P. Fouassier, M. Kaji, Y. Ichihashi, and Y. Murakami, J. Photopolym. Sci. Tech. 2003, 16(1), 123-128.
247. X. Allonas, J.P. Fouassier, M. Kaji, M. Miyasaka, and T. Hidaka, Polymer 2001, 42, 7627-7634.
248. F. Morlet-Savary, J.P. Fouassier, T. Matsumoto, K. Inomata, Polym. Adv. Technol. 1994, 5, 56-62.
249. G. Rist, A. Borer, K. Dietliker, V. Desobry, J.P. Fouassier, and D. Ruhlmann, Macromolecules 1992, 25, 4182-4193.
250. K. Dietliker, S. Broillet, B. Hellrung, P. Rzadek, G. Rist, J. Wirz, D. Neshchadin, and G. Gescheidt, Helv. Chem. Acta 2006, 89, 2211-2225.
251. L.Y. Lee, C. Xi, C. Giannotti, and D.G. Whitten, J. Am. Chem. Soc. 1986, 113, 2304.
252. L. Angiolini, D. Caretti, C. Carlini, E. Corelli, J.P. Fouassier, and F. Morlet-Savary, Polymer 1995, 36(21), 4055-4060.
253. K. Kawamura and K. Kato, Polym. Adv. Technol. 2004, 15(6), 324-328.
254. K. Kawamura, J. Photochem. Photobiol. A Chem. 2004, 162(2-3), 329-338.
255. D. Burget, J.P. Fouassier, F. Amat-Guerri, R. Mallavia, and R. Sastre, Acta Polym. 1999, 50, 337-346.
256. F. Scigalski and J. Paczkowski, Polimery (Warsaw, Poland), 2001, 46(9), 613-621.
257. K. Kawamura, Y. Aotani, and H. Tomioka, J. Phys. Chem. B 2003, 107(19), 4579-4586.
258. R. Liska, J. Polym. Sci. A Polym. Chem. 2004, 42(9), 2285-2301.
259. T. Urano, E. Hino, H. Ito, M. Shimizu, and T.Yamaoka, Polym. Adv. Technol. 1998, 9(12), 825-830.
260. T. Urano, H. Ito, and T. Yamaoka, Polym. Adv. Technol. 1999, 10(6), 321-328.
261. M. Harada, M. Kawabata, and Y. Takimoto, J. Photopolym. Sci. Tech. 1989, 2, 199.
262. J.P. Fouassier, A. Erddalane, F. Morlet-Savary, I. Sumiyoshi, M. Harada, and M. Kawabata, Macromolecules 1994, 27, 3349-3356.
263. J.P. Fouassier, D. Ruhlmann, Y. Takimoto, M. Harada, and M. Kawabata, J. Polym. Sci. A Polym. Chem. 1993, 31, 2245-2248.
264. J.P. Fouassier and E. Chesneau, Macromol. Chem. 1991, 192, 1307-1315.
265. K.S. Padon and A.B. Scranton, J. Polym. Sci. A Polym. Chem. 2000, 38(18), 3336-3346.
266. K. Kim and A. Scranton, J. Polym. Sci. A Polym. Chem. 2004, 42(23), 5863-5871.
267. M.L. Gomez, V. Avila, H.A. Montejano, and C.M. Previtali, Polymer 2003, 44(10), 2875-2881.
268. M.L. Gomez, H.A. Montejano, M. delValle Bohorquez, and C.M. Previtali, J. Polym. Sci. A Polym. Chem. 2004, 42(19), 4916-4920.
269. A. Erddalane, J.P. Fouassier, F. Morlet-Savary, and Y. Takimoto, J. Polym. Sci. A Polym. Chem. 1996, 34, 633-642.
270. H.J. Timpe, S. Ulrich, C. Decker, and J.P. Fouassier, Eur. Polym. J. 1994, 30(11), 1301-1307.
271. T.B. Cavitt, C.E. Hoyle, V. Kalyanaraman, and S. Jonsson, Polymer 2004, 45(4), 1119-1123.
272. J.P. Fouassier, X. Allonas, J. Lalevée, and M. Visconti, J. Polym. Sci. A Polym. Chem. 2000, 38, 4531-4541.
273. C. Grotzinger, D. Burget, P. Jacques, and J.P. Fouassier, Macromol. Chem. Phys. 2001, 202, 3513-3522.
274. C. Grotzinger, D. Burget, P. Jacques, and J.P. Fouassier, Polymer 2003, 44, 3671-3677.
275. J.P. Fouassier, F. Morlet-Savary,K.Yamashita, and S. Imahashi, J. Appl. Polym. Sci. 1996, 62, 1877-1885.
276. J.P. Fouassier, F. Morlet-Savary, K. Yamashita, and S. Imahashi, Polymer 1997, 38(6), 1415-1421.
277. X. Allonas, J.P. Fouassier, H. Obeid, M. Kaji, and Y. Ichihashi, J. Photopolym. Sci. Tech. 2004, 17(1), 35-40.
278. J. Lalevée, M. El Roz, F. Morlet-Savary, X. Allonas, and J.P. Fouassier, Chem.hys. 2009, 210(5), 311-319.
279. J. Yang and D.C. Neckers, J. Polym. Sci. A Polym. Chem. 2004, 42(15), 3836-3841.
280. D. Burget and J.P. Fouassier, J. Chem. Soc. Faraday Trans. 1998, 94(13), 1849-1854.
281. L. Catilaz-Simonin and J.P. Fouassier, J. Appl. Polym. Sci. 2001, 79, 1911-1923.
282. C. Grotzinger, D. Burget, P. Jacques, and J.P. Fouassier, J. Appl. Polym. Sci. 2001, 81, 2368-2376.
283. X. Allonas, J.P. Fouassier, M. Kaji, and Y. Murakami, Photochem. Photobiol. Sci. 2003, 2, 224-229.
284. C. Dong and X. Ni, J. Macromol. Sci. Pure Appl. Chem. 2004, 41(5), 547-563.
285. A.A. Ermoshkin,D.C.Neckers, and A.V. Fedorov, Macromolecules 2006, 39, 5669-5674.
286. X. Allonas, J. Lalevée, F. Morlet-Savary, and J.P. Fouassier, Polymery 2006, 51, 7-8.
287. F. Morlet Savary, X. Allonas, and J.P. Fouassier, in: J.P. Fouassier (Ed.), Photochemistry and UV Curing: New Trends, Research Signpost, Trivandrum, India, 2006, pp. 79-90.
288. X. Allonas, F. Morlet Savary, and J.P. Fouassier, in: J.P. Fouassier (Ed.), Photochemistry and UV Curing: New Trends, Research Signpost, Trivandrum, India, 9-16, 2006.
289. S. Jockusch and N.J. Turro, J. Am. Chem. Soc. 1998, 120(45), 11773-11777.
290. I.V. Koptyug, N.D. Ghatlia, G.W. Sluggett, N.J. Turro, S. Ganapathy, andW.G. Bentrude, J. Am. Chem. Soc. 1995, 117(37), 9486-9491.
291. U. Kolczak, G. Rist, K. Dietliker, and J. Wirz, J. Am. Chem. Soc. 1996, 118 (27),6477-6489.
292. X. Allonas, F. Morlet-Savary, J. Lalevée, and J.P. Fouassier, Photochem. Photobiol. 2006, 82(1), 88-94.
293. M. Spichty, N.J. Turro, G. Rist, J.L. Birbaum, K. Dietliker, J.P. Wolf, and G. Gescheidt, J. Photochem. Photobiol. A Chem. 2001, 142(2-3), 209-213.
294. C. Dietlin, X. Allonas, J.P. Fouassier, and A. Defoin, Photochem. Photobiol. Sci. 2008, 7, 552-557.
295. F. Morlet-Savary, X. Allonas, C. Dietlin, J.P. Malval, and J.P. Fouassier, J. Photochem. 2008, 197, 342-350.
296. X. Allonas, J. Lalevée, and J.P. Fouassier, J. Photochem. Photobiol. A Chem. 2003, 159 (2), 127-133.
297. X. Allonas, J. Lalevée, and J.P. Fouassier, J. Photopolym. Sci. Tech. 2004, 17(1), 29-34.
298. I.V. Khudyakov and N.J. Turro, in: J.P. Fouassier (Ed.), Photochemistry and UV Curing: New Trends, Research Signpost, Trivandrum, India, 2006, p. 241.
299. I.V. Khudyakov,N. Arsu, S. Jockusch, and N.J. Turro, Design. Monom. Polym. 2003, 6(1), 91-101.
300. J. Lalevée, X. Allonas, and J.P. Fouassier, J. Am. Chem. Soc. 2002, 124(32), 9613-9621.
301. J. Lalevée, D. Gigmes, X. Allonas, and J.P. Fouassier, Chem.hys. Lett. 2007, 438, 346-350.
302. X. Allonas, J. Lalevée, J.P. Fouassier, and K.D. Belfield,in: J.V. Crivello (Ed.), Photoinitiated Polymerization, ACS Symposium Series 847, 2003, pp. 140-149.
303. P. Hunt, D.R. Worrall, F. Wilkinson, and S.N. Batchelor, Photochem. Photobiol. Sci. 2003, 2(5), 518-523.
304. C.S. Colley, D.C. Grills, N.A. Besley, S. Jockusch, P. Matousek, A.W. Parker, N.J. Town, P.M.W. Gill, and M.W. George, J. Am. Chem. Soc. 2002, 124(50), 14952-14958.
305. T. Lund, P. Christensen, and R.Wilbrandt, Org. Biomol. Chem. 2003, 1(6), 1020-1025.
306. X.-G. Lei, S. Jockusch, M.F. Ottaviani, and N.J. Turro, Photochem. Photobiol. Sci. 2003, 2(11), 1095-1100.
307. I. Janovsky, W. Knolle, S. Naumov, and F. Williams, Chem. Eur. J. 2004, 10(21), 5524-5534.
308. G. Wenska, K. Taras-Goslinska, B. Skalski, G.L. Hug, I. Carmichael, and B. Marciniak, J. Org. Chem. 2005, 70(3), 982-988.
309. M. Sakamoto, X. Cai, M. Hara, M. Fujistuka, and T. Majima, J. Phys. Chem. A 2005, 109(11), 2452-2458.
310. G. El Dib, A. Chakir, E. Roth, J. Brion, and D. Daumont, J. Phys. Chem. A 2006, 100(25), 7848-7857.
311. X. Zhang and W.M. Nau, J. Phys. Org. Chem. 2000, 13(10), 634-639.
312. T.N. Das, R.E. Huie, P. Neta, and S. Padmaja, J. Phys. Chem. A 1999, 103(27), 5221-5226.
313. I.V. Vlasyuk, V.A. Bagryansky, N.P. Gritsan, Y.N. Molin, M.A. Yu, Y.V. Gatilov, V.V. Shcherbukhin, and A.V. Zibarek, Phys. Chem. Chem. Phys. 2001, 3(3), 409-415.
314. I.P. Beletskaya, A.S. Sigeev, V.A. Kuzmin, A.S. Tatikolov, and L. Hevesi, J. Chem. Soc. Perkin Trans. 2000, 2(1), 107-109.
315. M. Hoshino, R. Konishi, H. Seto, H. Seki, H. Sonoki, T. Yokoyama, and H. Shimamori, Res. Chem. Intermed. 2001, 27(1-2), 189-204.
316. U. Pischel and W.M. Nau, J. Am. Chem. Soc. 2001, 123(40), 9727-9737.
317. M.A. Miranda, E. Font-Sanchis, J. Perez-Prieto, and J.C. Scaiano, J. Org. Chem. 2002, 67(17), 6131-6135.
318. R. Dabestani, I.N. Ivanov, P.F. Britt, M.E. Sigman, and A.C.III. Buchanan, Preprints of Symposia, AmericanChemical Society, Division of Fuel Chemistry, 2002, 47(1), 390-392.
319. V.V. Jarikov, A.V. Nikolaitchik, and D.C. Neckers, J. Phys. Chem. 2000, 104(21), 5131-5140.
320. S. Jockusch and N.J. Turro, J. Am. Chem. Soc. 1999, 121(16), 3921-3925.
321. I. Gatlik, P. Rzadek, G. Gescheidt, G. Rist, B. Hellrung, J. Wirz, K. Dietliker, G. Hug, M. Kunz, and J.P. Wolf, J. Am. Chem. Soc. 1999, 121(36), 8332-8336.
322. J.M. Fede, S. Jockusch, N. Lin, R.A. Moss, and N.J. Turro, Org. Lett. 2003, 5(26), 5027-5030.
323. M. Weber, I.V. Khudyakov, and N.J. Turro, J. Phys. Chem. 2002, 106(10), 1938-1945.
324. N.J. Turro, X.-G. Lei, S. Jockusch,W. Li, Z. Liu, L. Abrams, and M.F. Ottaviani, J. Org. Chem. 2002, 67(8), 2606-2618.
325. M. Terazima, Y. Nogami, and T. Tominaga, Chem.hys. Lett. 2000, 332(5,6), 503-507.
326. A.L. Konkin, H.K. Roth, M. Schroedner, G.A. Nazmutdinova, A.V. Aganov, T. Ida, and R.R. Garipov, Chem.hys. 2003, 287(3), 377-389.
327. J. Lalevée, X. Allonas, and J.P. Fouassier, Chem.hys. Lett. 2005, 415(4-6), 287-290.
328. J.C. Scaiano J. Phys. Chem. 1981, 85, 285-292.
329. J. Lalevée, X. Allonas, and J.P. Fouassier, J. Org. Chem. 2006, 71, 9723-9727.
330. J. Lalevée, X. Allonas, and J.P. Fouassier, J. Phys. Chem. 2006, 110, 11605-11612.
331. J. Lalevée, X. Allonas, and J.P. Fouassier, Chem.hys. Lett. 2006, 429, 282.
332. J. Lalevée, X. Allonas, S. Genet, and J.P. Fouassier, J. Am. Chem. Soc. 2003, 125(31), 9377-9380.
333. J. Lalevée, X. Allonas, and J.P. Fouassier, Chem.hys. Lett. 2007, 445, 62-67.
334. H. Fischer and L. Radom, Angew. Chem. Int. Ed. 2001, 40, 1340-1349.
335. J. Lalevée, X. Allonas, and J.P. Fouassier, J. Phys. Chem. A 2004, 108(19), 4326-4334.
336. J. Lalevée, X. Allonas, and J.P. Fouassier, J. Org. Chem. 2005, 70(3), 814-819.
337. J. Lalevée, X. Allonas, and J.P. Fouassier, Macromolecules 2005, 38(10), 4521-4524.
338. J. Lalevée, X. Allonas, J.P. Fouassier, D. Rinaldi, R. Lopez, and J.L. Rivail, Chem.hys. Lett. 2005, 415(4-6), 202-205.
339. J. Lalevée, X. Allonas, B. Graff, and J.P. Fouassier, J. Phys. Chem. A in press.
340. J. Lalevée, X. Allonas, and J.P. Fouassier, J. Polym. Sci. A Polym. Chem. 2006, 44(11), 3577-3587.
341. J. Lalevée, X. Allonas, and J.P. Fouassier, Phys. Lett. 2008, 466, 227-230.
342. J. Lalevée, X. Allonas, S. Jradi, and J.P. Fouassier, Macromolecules 2006, 39(5), 1872-1879.
343. T. Urano, Y. Tsurutani, M. Ishikawa, and H. Itoh, J. Photopolym. Sci. Technol. 2000, 13 (1), 83-88.
344. T. Urano, M. Ishikawa, and H. Itoh, Imaging Sci. J. 1999, 47(3), 121-125.
345. T. Hatano, K. Fukui, T. Karatsu, A. Kitamura, and T. Urano, J. Photopolym. Sci. Technol. 2000, 13(5), 697-701.
346. D. Greszta, D. Mardare, and K. Matyjaszewski, Macromolecules, 1994, 27, 638-644.
347. A.F. Jacobine,in: J.P. Fouassier (Ed.), Radiation Curing in Polymer Science and Technology, Elsevier, Barking, 1993.
348. C.E. Hoyle, Proc. RadTech 2002, Indianapolis 674, 2002.
349. T.Y. Lee, T.M. Roper, E.S. Jonsson, I. Kuyakov, K. Viswanathan, C. Nason, C. A. Guymon, and C.E. Hoyle, Polymer 2003, 44(10), 2859-2865.
350. C. Bibaut-Renaud, D. Burget, J.P. Fouassier, C.G. Varelas, J. Thomatos, G. Tsagaropoulos, L.O. Ryrfors, and O.J. Karsonn, J. Polym. Sci. A Polym. Chem. 2002, 40(18), 3171-3181.
351. M. Manea, K. Ogemark, and L.S. Svensson,in: J.P. Fouassier (Ed.), Photochemistry and UV Curing: New Trends, Research Signpost, Trivandrum, India, 2006, pp. 445-460.
352. S. Jonsson, P.E. Sundell, M. Shimose, J. Owens, and C.E. Hoyle, Polym. Mat. Sci. Eng. 1995, 72, 470-472.
353. O. Soppera and C. Croutxe Barghorn, J. Polym. Sci. A Polym. Chem. 2003, 41, 831-838.
354. Y. Ichihashi and M. Kaji, J. Photopolymer Sci. Tech. 2004, 17, 135-140.
355. S. Suzuki, T. Urano, K. Ito, T. Murayama, I. Hotta, S. Takahara, and T. Yamaoka, J. Photopolym. Sci. Tech. 2004, 17, 125-129.