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Journal of Photopolymer Science and Technology

Volumn 13, Issue 1, 2000, Pages 83-88

Photoinitiation mechanisms in photopolymer layer

(4) Urano, Toshiyuki a Tsurutani, Yasuyuki a Ishikawa, Masayo a Itoh, Hiroki a

a MITSUBISHI CHEMICAL CORPORATION (Japan)

Author keywords

Acrylate monomer; Imidazoyl radical; Oxygen; Photopolymerization; Sensitization

Indexed keywords

ACRYLIC ACID; DYE; IMIDAZOLE DERIVATIVE; MONOMER; OXYGEN; POLY(METHYL METHACRYLATE); POLYMER; POLYVINYL ALCOHOL; RADICAL;

ARTICLE; CHEMICAL STRUCTURE; FILM; PHOTOCHEMISTRY; PHOTOLYSIS; PHOTOSENSITIZATION; POLYMERIZATION; REACTION ANALYSIS; STRUCTURE ANALYSIS;

EID: 0034583993 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.13.83 Document Type: Article

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.