Photopolymerization of thiol-allyl ether and thiol-acrylate coatings with visible light photosensitive systems

Polymer

Volumn 45, Issue 19, 2004, Pages 6561-6567

  Burget, D ^a   Mallein, C ^a   Fouassier, J P ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

Photopolymerization; Photosensitive system; Thiol allyl ether and thiol acrylate coatings

Indexed keywords

ETHERS; MIXTURES; PHOTOSENSITIVITY; REACTION KINETICS;

PHOTOINITIATING SYSTEMS; THIOL ALLYL ETHER;

PHOTOPOLYMERIZATION;

ACRYLIC ACID; ALLYL ETHER; ETHER DERIVATIVE; FERROCENE DERIVATIVE; HYDROPEROXIDE; ROSE BENGAL; THIOL; UNCLASSIFIED DRUG;

ARTICLE; LIGHT; MECHANICS; PHOTOACTIVATION; PHOTOREACTIVITY; POLYMERIZATION; REACTION ANALYSIS;

POLYMER SCIENCE;

EID: 4444291102     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2004.07.052     Document Type: Article

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