Thiyl radical generation in thiol or disulfide containing photosensitive systems

Macromolecular Chemistry and Physics

Volumn 210, Issue 5, 2009, Pages 311-319

  Lalevée, Jacques ^a   Morlet Savary, Fabrice ^a   Roz, Mohamad El ^a   Allonas, Xavier ^a   Fouassier, Jean Pierre ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

Bisimidazole; Disulfide; Monomers; Photoinitiator; Photopolymerizatiori; Thiol; Time resolved laser spectroscopy

Indexed keywords

KETONES; LASER SPECTROSCOPY; LASERS; LIGHT SENSITIVE MATERIALS; MOLECULAR ORBITALS; MONOMERS; PHOTOLYSIS; PHOTOPOLYMERIZATION; PHOTOSENSITIVITY; SPECTRUM ANALYSIS; SULFUR;

BISIMIDAZOLE; DISULFIDE; PHOTOINITIATOR; PHOTOPOLYMERIZATIORI; THIOL; TIME RESOLVED LASER SPECTROSCOPY;

RATE CONSTANTS;

EID: 61849108867     PISSN: 10221352     EISSN: 15213935     Source Type: Journal    
DOI: 10.1002/macp.200800566     Document Type: Article

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