Tris(trimethylsilyl)silane (TTMSS)-derived radical reactivity toward alkenes: A combined quantum mechanical and laser flash photolysis study

Journal of Organic Chemistry

Volumn 72, Issue 17, 2007, Pages 6434-6439

  Lalevée, Jacques ^a   Allonas, Xavier ^a   Fouassier, Jean Pierre ^a  

^a Ecole Nationale Superieure de Chimie de Mulhouse   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLATE MONOMERS; ANTIOXIDANTS; HYDROGEN ABSTRACTION RATE CONSTANTS;

FREE RADICAL POLYMERIZATION; HYDROGEN; MONOMERS; OLEFINS; PHOTOLYSIS; RATE CONSTANTS;

PARAFFINS;

ACRYLIC ACID METHYL ESTER; ALKENE; ALPHA TOCOPHEROL; ANTIOXIDANT; HYDROGEN; MONOMER; RADICAL; SILANE DERIVATIVE; TRIS(TRIMETHYLSILY)SILANE; UNCLASSIFIED DRUG;

ARTICLE; CALCULATION; CHEMICAL STRUCTURE; ENTHALPY; IONIZATION; LASER FLASH PHOTOLYSIS; MATHEMATICAL ANALYSIS; PHOTOLYSIS; POLYMERIZATION; QUANTUM MECHANICS; REACTION ANALYSIS; REACTION TIME;

EID: 34547940323     PISSN: 00223263     EISSN: None     Source Type: Journal    
DOI: 10.1021/jo0706473     Document Type: Article

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