Photopolymerization reactions under visible lights: Principle, mechanisms and examples of applications

Progress in Organic Coatings

Volumn 47, Issue 1, 2003, Pages 16-36

  Fouassier, J P ^a   Allonas, X ^a   Burget, D ^a  

^a Ecole Nationale Superieure de Chimie de Mulhouse   (France)

Author keywords

Photopolymerization; Radiation curing; Visible light

Indexed keywords

COATINGS; INDUSTRIAL APPLICATIONS; LASER APPLICATIONS; LIGHT; PHOTOCHEMICAL REACTIONS; PIGMENTS; REACTION KINETICS;

VISIBLE LIGHT;

PHOTOPOLYMERIZATION;

EID: 0038043268     PISSN: 03009440     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0300-9440(03)00011-0     Document Type: Article

References (92)

1. (a) S.P. Pappas (Ed.), UV Curing: Science and Technology, Wiley, New York, 1992;
2. (b) SITA Books for UV and EB Chemistry, SITA, London, 1990, 2000;
3. (c) C.G. Roffey, Photopolymerization of Surface Coatings, Wiley, New York, 1982.
4. A. Reiser, Photoreactive Polymers: The Science and Technology of Resists, Wiley, New York, 1989.
5. J.P. Fouassier, J.F. Rabek (Eds.), Laser in Polymer Science and Technology: Applications, CRC Press, Boca Raton, FL, 1990.
6. J.P. Fouassier, J.F. Rabek (Eds.), Radiation Curing and Polymer Science and Technology, Chapman & Hall, Andover, 1993.
7. J.P. Fouassier, Photoinitiation, Photopolymerization, Photocuring, Carl Hanser, Munich, 1995.
8. (a) J.F. Rabek, Mechanisms of Photophysical and Photochemical Reactions in Polymer: Theory and Practical Applications, Wiley, New York, 1987;
9. (b) D.C. Neckers, UV and EB at the Millenium, SITA Technology, Londres, 1999;
10. (c) R.S. Davidson, Exploring the Science, Technology and Application of UV and EB Curing, SITA Technology, Londres, 1999.
11. (a) H.J. Timpe, Photopolymere: Prinzipien und Anwendungen. Sitzungsberichte der Akademie der Wissenschaften der DDR, vol. 13, 1986, p. 1;
12. (b) C.E. Hoyle, J.F. Kinstle (Eds.), Radiation Curing of Polymeric Materials, American Chemical Society, Washington, DC, 1990;
13. (c) N.S. Allen, M. Edge, I.R. Bellobono, E. Selli (Eds.), Current Trends in Polymer Photochemistry, Ellis Horwood, New York, 1995;
14. (d) H. Bottcher, Technical Applications of Photochemistry, Deutscher, Leipzig, 1991;
15. (e) C.G. Roffey (Ed.), Photogeneration of Reactive Species for UV Curing, Wiley, Chichester, UK, 1997, 866 pp.;
16. (f) A.D. Trifunac, U.V. Krongrauz (Eds.), Processes in Photoreactive Polymers, Chapman & Hall, New York, 1995;
17. (g) A.B. Scranton, A. Bowman, R.W. Peiffer (Eds.), ACS Symposium Series, vol. 673, American Chemical Society, Washington, DC, 1997;
18. (h) J.C. Salamone (Eds.), Polymeric Materials Encyclopedia, CRC Press, Boca Raton, FL, 1996;
19. (i) Shirai M., Suyama K., Tsunooka M. Trends Photochem. Photobiol. 5:1999;169;
20. (j) Crivello J.V., Kong S. J. Polym. Sci. Polym. Chem. 38:2000;1433;
21. (k) V. Desobry, J. Cunningham, in: J.P. Fouassier, J.F. Rabek (Eds.), Radiation Curing Science and Technology, Chapman & Hall, London, 1993;
22. (l) K. Dietliker, in: J.P. Fouassier, J.F. Rabek (Eds.), Radiation Curing Science and Technology, Chapman & Hall, London, 1993;
23. (m) W.K. Smothers, B.M. Monroe, A.W. Weber, D.E. Keys, SPIE OE/Laser Conference Proceedings, Los Angeles, 1990, p. 1212;
24. (n) Urano T., Ito H., Yamaoka T. Polym. Adv. Technol. 10:1999;321;
25. (o) Jakubiak J., Rabek J.F. Polimery (Warsaw). 44(7-8):1999;447;
26. (p) Sirovatka Padon K., Scranton A.B. J. Polym. Sci. A. 38:2000;3336;
27. (q) Hu S., Sarker A.M., Kaneko Y., Neckers D.C. Macromolecules. 31(19):1998;6476;
28. (r) Hu S., Malpert J.H., Yang X., Neckers D.C. Polymer. 41(2):2000;445;
29. (s) Kaneko Y., Neckers D.C. J. Phys. Chem. A. 102(28):1998;5356.
30. J.P. Fouassier, Current Trends in Polymer Science, 1999, p. 4.
31. Fouassier J.P. Recent Res. Dev. Photochem. Photobiol. 4:2000;51.
32. Fouassier J.P. Recent Res. Dev. Polym. Sci. 4:2000;131.
33. Allonas X., Ley C., Bibaut C., Jacques P., Fouassier J.P. Chem. Phys. Lett. 322:2000;483.
34. (a) J.P. Fouassier, X. Allonas, Proceedings of the RadTech Japan 2000 Symposium, Yokohama, vol. 78, 2000;
35. (b) X. Allonas, J. Lalevée, J.P. Fouassier, Proceedings of the ACS Meeting, Chicago, 2001, Polym. Prepr. 42 (1) (2001) 805, 2001 and ACS Symposium Series 847, "Photoinitiated polymerization", K.D. Belfield, J.V. Crivello (Eds.), (2003) 140.
36. (b) X. Allonas, J. Lalevée, J.P. Fouassier, Proceedings of the ACS Meeting, Chicago, 2001, Polym. Prepr. 42 (1) (2001) 805, 2001 and ACS Symposium Series 847, "Photoinitiated polymerization", K.D. Belfield, J.V. Crivello (Eds.), (2003) 140.
37. Allonas X., Ley C., Gaumé R., Jacques P., Fouassier J.P. Trends Photochem. Photobiol. 5:1999;93.
38. (a) Fouassier J.P., Morlet-Savary F. Opt. Eng. 35(1):1996;304;
39. (b) Fouassier J.P., Morlet-Savary F. Opt. Memory Neutral Networks. 4(1):1995;11;
40. (c) Fouassier J.P., Ruhlmann D., Graff B., Takimoto Y., Kawabata M., Harada M. J. Imaging Sci. Technol. 37(2):1993;208;
41. (d) Fouassier J.P., Chesneau E., Le Baccon M. Makromol. Chem. Rapid. Commun. 9:1988;223.
42. (a) Fouassier J.P., Catilaz-Simonin L., Navergoni P. J. Radiat. Curing. 21(4):1995;10;
43. (b) Catilaz L., Fouassier J.P., Navergoni P. PCT Int. Appl. WO. 93:1993;15440;
44. (c) L. Simonin-Catilaz, J.P. Fouassier, Proceedings of the RadTech, Orlando, USA, 1994, pp. 423-435.
45. (a) Burget D., Fouassier J.P. J. Chem. Soc., Faraday Trans. 94(13):1998;1849;
46. (b) Grotzinger C., Burget D., Jacques P., Fouassier J.P. J. Appl. Polym. Sci. 81:2001;2368.
47. (a) Catilaz L., Fouassier J.P. J. Appl. Polym. Sci. 79:2001;1911;
48. (b) D. Burget, L. Simonin-Catilaz, J.P. Fouassier, Proceedings of the RadTech America Conference, Baltimore, 2000, p. 386.
49. Astruc D. Chem. Rev. 88:1988;1189.
50. Fouassier J.P., Morlet-Savary F., Yamashita K., Imahashi S. J. Appl. Polym. Sci. 62:1996;1877.
51. D. Burget, C. Grotzinger, J.P. Fouassier, Res. Trends 7 (2001) 71.
52. C. Grotzinger, D. Burget, P. Jacques, J.P. Fouassier, Polymer, in press.
53. Islam S.D.M., Ito O. J. Photochem. Photobiol. A. 123:1999;53.
54. (a) Fouassier J.P., Chesneau E. Makromol. Chem. 192:1991;245-260;
55. (b) Mallavia R., Amat-Guerri F., Fimia A., Sastre R. Macromolecules. 27:1994;2643;
56. (c) Burget D., Fouassier J.P., Amat-Guerri F., Mallavia R., Sastre R. Acta Polym. 50:1999;337.
57. Fouassier J.P., Lemée V., Espanet A., Burget D., Morlet-Savary F., Di Battista P., Li Bassi G. Eur. Polym. J. 33(6):1997;881.
58. Rist G., Borer A., Dietliker K., Desobry V., Fouassier J.P., Ruhlmann D. Macromolecules. 25:1992;4182.
59. Fouassier J.P., Erddalane A., Morlet-Savary F., Sumiyoshi I., Harada M., Kawabata M. Macromolecules. 27:1994;3349.
60. Morlet-Savary F., Parret S., Fouassier J.P., Inomata K., Matsumoto T. J. Chem. Soc., Faraday Trans. 94(6):1998;745.
61. M. Visconti, M. Cattaneo, A. Casiraghi, G. Norcini, G. Li Bassi, X. Allonas, J.P. Fouassier, Proceedings of the RadTech American Conference, Baltimore, 2000, p. 414.
62. J.P. Fouassier, A. Erddalane, F. Morlet-Savary, X. Allonas, Y. Takimoto, I. Sumiyoshi, Proceedings of the RadTech Europe'97, Lyon, 1997, pp. 177-181.
63. Fouassier J.P., Buat F., Donze J.J., Freytag R. Eur. Coat. J. 3(95):1995;279.
64. Medenouvo F., Fouassier J.P. Die Angew. Makromol. Chem. 229:1995;29.
65. Eiselé G., Fouassier J.P., Reeb R. J. Polym. Sci. A. 35:1997;2333.
66. (a) Greek Patent (assigned to Interchem SA) pending (appl. Date: Nov. 2, 2000);
67. (b) C. Bibaut, D. Burget, J.P. Fouassier, L.O. Ryrforth, O. Karlson, G. Tsaragopoulos, Proceedings of the RadTech, Europe, Basel (2001) 663.
68. (a) Allonas X., Fouassier J.P., Angiolini L., Caretti D. Helv. Chim. Acta. 84:2001;2577;
69. (b) Angiolini L., Caretti D., Salatelli E. Macromol. Chem. Phys. 201:2000;2646;
70. Nie J., Andrzejewska E., Rabek J.F., Linden L.A., Fouassier J.P., Paczkowski J., Scigalski F., Wrzyszczynski A. Macromol. Chem. Phys. 200:1999;1692.
71. Lemée V., Burget D., Fouassier J.P., Tomioka H. Eur. Polym. J. 36:2000;1221.
72. Tomioka H., Takase N., Maeyama Y., Hida K., Lemée V., Fouassier J.P., Burget D. Res. Chem. Intermediates. 27(1-2):2001;47.
73. X. Allonas, C. Grotzinger, J. Lalevé. J.P. Fouassier, M. Visconti, Eur. Polym. J. 37 (2001) 897.
74. (a) M. Visconti, M. Cattaneo, E. Meneguzzo, G. Li Bassi, Proceedings of the RadTech Europe, Berlin, 1999;
75. (b) Fouassier J.P., Allonas X., Lalevée J., Visconti M. J. Polym. Sci. A. 38:2000;4531.
76. X. Allonas, J. Lalevée, J.P. Fouassier, H. Tachi, M. Tsunooka, Proceedings of the RadTech Europe Conference, Basel, 2001, p. 651.
77. (a) Lougnot D.J., Ritzenthaler D., Carré C., Fouassier J.P. J. Appl. Phys. 63(10):1988;4841;
78. (b) Croutxe-Barghorn C., Soppera O., Lougnot D.J. Eur. Phys. J. AP. 13:2001;31;
79. (c) C. Carré, C. Heinis, D.J. Lougnot, Proceedings of the SPIE - Advanced Optical Data Storage: Materials, Systems and Interfaces to Computers, Denver, 1999, p. 3802.
80. Fouassier J.P., Morlet-Savary F., Yamashita K., Imahashi S. Polymer. 38(6):1997;1415.
81. Koseki K., Miyaguchi S., Yamaoka T., Yamada E., Goto Y. Nippon Kagaku Kaishi. 1:1985;119.
82. Goto Y., Yamada E., Nakayama M., Tokumaru K. J. Polym. Sci. A. 26:1988;1671.
83. R. Akaba, H. Sakuragi, K. Tokumaru, J. Chem. Soc., Perkin Trans. 2, 291, 1991.
84. (a) Morlet-Savary F., Wieder F., Fouassier J.P. J. Chem. Soc., Faraday Trans. 93(22):1997;3931;
85. (b) Morlet-Savary F., Parret S., Fouassier J.P., Inomata K., Matsumoto T. J. Chem. Soc., Faraday Trans. 94(6):1998;745.
86. Bachofner H.E., Beringer F.M., Meites L. J. Am. Chem. Soc. 80:1958;4269.
87. (a) K. Maeda, in: V.V. Krongauz, A.D. Trifunac (Eds.), Processes in Photoreactive Polymers, Chapman & Hall, New York, 1995;
88. (b) T. Yamaoka, K. Naitoh, in: V.V. Krongauz, A.D. Trifunac (Eds.), Processes in Photoreactive Polymers, Chapman & Hall, New York, 1995.
89. Urano T., Hino E., Ito H., Shimizu M., Yamaoka T. Polym. Adv. Technol. 9:1998;825.
90. Fang G., Xu J., Yang Y. J. Photopolym. Sci. Technol. 12(2):1999;339.
91. (a) Allonas X., Fouassier J.P., Kaji M., Miyasaka M. J. Photopolym. Sci. Technol. 13:2000;237;
92. (b) Allonas X., Fouassier J.P., Kaji M., Miyasaka M., Hidaka T. Polymer. 4:2001;7627.