Pyrromethene dye sensitized photopolymer and the application to visible laser direct imaging

Journal of Photopolymer Science and Technology

Volumn 17, Issue 1, 2004, Pages 125-129

  Suzuki, Shota ^b,c   Urano, Toshiyuki ^d   Ito, Katsuhiro ^d   Murayama, Toshikazu ^d   Hotta, Iwao ^a   Takahara, Shigeru ^a   Yamaoka, Tsuguo ^a  

^a CHIBA UNIVERSITY   (Japan)

^b MCC Grp Sci and Technol Res Ctr   (Japan)

^c MITSUBISHI CHEMICAL CORPORATION   (Japan)

^d Kyowa Hakko Chemical   (Japan)

Author keywords

Naphthalimide; Photoacid generator; Photoresist; Printing; Pyrromethene; Sensitization mechanism; Visible laser direct imaging

Indexed keywords

ACID; DYE; NAPHTHALENE DERIVATIVE; NAPHTHALIMIDE; POLYMER; PYRROMETHENE; UNCLASSIFIED DRUG;

CHEMICAL PROCEDURES; COMPUTER; CONFERENCE PAPER; FILM; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; LASER; PHOTOLYSIS; PHOTOSENSITIVITY; SPECTROFLUOROMETRY;

EID: 3142617462     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.125     Document Type: Conference Paper

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