Development of an alkaline-compatible porous-silicon photolithographic process

Journal of Microelectromechanical Systems

Volumn 20, Issue 2, 2011, Pages 418-423

  Lai, Meifang ^a   Parish, Giacinta ^a   Liu, Yinong ^a   Dell, John M ^a   Keating, Adrian J ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

Alkaline developer; passivation; photolithography; porous silicon (PS)

Indexed keywords

ALKALINE DEVELOPER; FILM DEGRADATION; FOURIER TRANSFORM INFRARED; LIFT-OFF PROCESS; LOW TEMPERATURES; NITROGEN ANNEALING; OPTICAL THICKNESS; PHOTOLITHOGRAPHIC PROCESS; PHOTOLITHOGRAPHY PROCESS; PROTECTIVE POLYMER LAYER; SPECTRAL REFLECTANCE MEASUREMENTS;

ALKALINITY; CHEMICAL RESISTANCE; FOURIER TRANSFORMS; OPTICAL PROPERTIES; PASSIVATION; PHOTORESISTS; POLYMER FILMS; POROUS SILICON;

OPTICAL FILMS;

EID: 79953741213     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2011.2111356     Document Type: Article

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