Optical properties of Teflon® AF amorphous fluoropolymers

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 7, Issue 3, 2008, Pages

  Yang, Min K ^a   French, Roger H ^a   Tokarsky, Edward W ^a  

^a DUPONT COMPANY   (United States)

Author keywords

Absorbance absorption coefficient; Fluoropolymer; VUV ellipsometry

Indexed keywords

ABSORPTION; LIGHT REFRACTION; REFRACTION; REFRACTIVE INDEX; REFRACTOMETERS; SPECTROSCOPIC ELLIPSOMETRY;

ABSORBANCES; ABSORPTION COEFFICIENTS; ABSORPTION EDGES; EXTINCTION COEFFICIENT (K); FLUOROPOLYMER; MULTIPLE MEASUREMENTS; SI SUBSTRATES; TRANSMISSION INTENSITY; URBACH EDGE; VUV ELLIPSOMETRY;

POLYTETRAFLUOROETHYLENES;

EID: 79953700477     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2965541     Document Type: Article

References (19)

1. P. R. Resnick and W. H. Buck, in Modern Fluoropolymers, J. Schiers, Ed., pp. 397-419, Wiley, West Sussex, England (1997).
2. G. Belanger, P. Sauvageau, and C. Sandorfy, "The far-ultraviolet spectra of perfluoro-normal-paraffins," Chem. Phys. Lett. 3(8), 649 (1969).
3. K. Seki, H. Tanaka, T. Ohta, Y. Aoki, A. Imamura, H. Fujimoto, H. Yamamoto, and H. Inokuchi, "Electronic structure of poly(tetrafluoroethylene ) studied by UPS,VUV absorption, and band calculations," Phys. Scr. 41, 167 (1990).
4. T. M. Bloomstein, M. Rothschild, R. R. Kunz, D. E. Hardy, R. B. Goodman, and S. T. Palmacci, "Critical issues in 157 nm lithography," J. Vac. Sci. Technol. B 16(6), 3154 (1998).
5. B. Johs, R. H. French, F. D. Kalk, W. A. McGahan, J. A. Woollam, "Optical interference coatings," Proc. SPIE 2253, 1098 (1994).
6. J. A. Woollam, B. Johs, C. M. Herzinger, J. Hilfiker, R. Synowicki, C. L. Bungay, "Overview of variable angle spectroscopic ellipsometry (VASE), part I: basic theory and typical applications," Proc. SPIE CR72, 3-28 (1999).
7. R. H. French, J. S. Meth, J. R. G. Thorne, R. M. Hochstrasser, and R. D. Miller, "Vacuum ultraviolet spectroscopy of the optical properties and electronic structure of seven poly(di-alkylsilanes)," Synth. Met. 50(1-3), 499-508 (1992). (Pubitemid 23579939)
8. M. E. Innocenzi, R. T. Swimm, M. Bass, R. H. French, and M. R. Kokta, "Optical absorption in undoped yttrium aluminum garnet," J. Appl. Phys. 68(3), 1200-1204 (1990).
9. 3," J. Appl. Phys. 67(12), 7542-7546 (1990).
10. J. A. Woollam, B. Johs, C. M. Herzinger, J. Hilfiker, R. Synowicki, and C. L. Bungay, "Overview of variable angle spectroscopic ellipsometry (VASE), part II: advanced applications," Proc. SPIE CR72, 29-58 (1999).
11. B. Johs, R. H. French, F. D. Kalk, W. A. McGahan, and J. A. Woollam, "Optical analysis of complex multilayer structures using multiple data types," in Optical Interference Coatings, F. Abeles, Ed., Proc. SPIE 2253, 1098-1106 (1994).
12. F. Wooten, Optical Properties of Solids, p. 49, Academic Press, New York (1972).
13. W. Sellmeier, "II. Regarding the sympathetic oscillations excited in particles by oscillations of the ether and their feedback to the latter, particularly as a means of explaining dispersion and its anomalies," (in German), Ann. Phys. Chem. 147, 524-54 (1872(; http://en.wikipedia.org/wiki/ Sellmeier-equation.
14. R. H. French, R. C. Wheland, D. J. Jones, J. N. Hilfiker, R. A. Synowicki, F. C. Zumsteg, J. Feldman, and A. E. Feiring, "Fluoropolymers for 157-nm lithography: optical properties from VUV absorbance and ellipsometry measurements," in Optical Microlithography XIII, C. J. Progler, Ed., Proc. SPIE 4000, 1491-1502 (2000).
15. R. H. French, J. Gordon, D. J. Jones, M. F. Lemon, R. C. Wheland, E. Zhang, F. C. Zumsteg, K. G. Sharp, and W. Qiu, "Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography," in Optical Microlithography XIV, C. J. Progler, Ed., Proc. SPIE 4346, 89-97 (2001).
16. R. H. French, K. I. Winey, M. K. Yang, and W. Qiu, "Optical properties and van der Waals-London dispersion interactions of polystyrene determined by vacuum ultraviolet spectroscopy and spectroscopic ellipsometry," Aust. J. Chem. 60, 251-263 (2007). (Pubitemid 46674921)
17. R. H. French, H. Sewell, M. K. Yang, S. Peng, D. McCafferty, W. Qiu, R. C. Wheland, M. F. Lemon, L. Markoya, and M. K. Crawford, "Imaging Of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k1 of 0.25," J. Microlithogr., Microfabr., Microsyst. 4(3), 031103 (2005).
18. F. Urbach, "The long-wavelength edge of photographic sensitivity and of the electronic absorption of solids," Phys. Rev. 92, 1324 (1953).
19. R. H. French, R. C. Wheland, W. Qiu, M. F. Lemon, E. Zhang, J. Gordon, V. A. Petrov, V. F. Cherstkov, and N. I. Delaygina, "Novel hydrofluorocarbon polymers for use as pellicles in 157-nm semiconductor photolithography," J. Fluorine Chem. 122, 63-80 (2003).