Fluoropolymers for 157 nm lithography: Optical properties from VUV absorbance and ellipsometry measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  French, Roger H ^a   Wheland, Robert C ^a   Jones, David J ^a   Hilfiker, James N ^a   Synowicki, R A ^a   Zumsteg, Frederick C ^a   Feldman, Jerald ^a   Feiring, Andrew E ^a  

^a DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; ETALONS; FLUORINE CONTAINING POLYMERS; LIGHT ABSORPTION; OPTICAL PROPERTIES; SPECTROSCOPIC ANALYSIS; THIN FILMS; ULTRAVIOLET RADIATION; VACUUM;

FRESNEL ANALYSIS; PELLICLES; VACUUM ULTRAVIOLET (VUV) ELLIPSOMETRY; VACUUM ULTRAVIOLET (VUV) SPECTROSCOPY;

PHOTORESISTS;

EID: 0033701324     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)