Materials design and development of fluoropolymers for use as pellicles in 157 nm photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 89-97

  French, Roger H ^a   Gordon, Joseph ^b   Jones, David J ^a   Lemon, M F ^a   Wheland, Robert C ^a   Zhang, Edward ^b   Zumsteg, Fredrick C ^a   Sharp, Kenneth G ^a   Qiu, Weiming ^a  

^a DUPONT COMPANY   (United States)

^b DuPont Photomasks Inc   (United States)

Author keywords

157 nm lithography; Absorbance; Fluoropolymer; Pellicle; Radiation durability; VUV ellipsometry; VUV spectroscopy

Indexed keywords

ARGON; ELLIPSOMETRY; FLUORINE CONTAINING POLYMERS; GLASS TRANSITION; KRYPTON; LIGHT TRANSMISSION; MOLECULAR WEIGHT; OPTICAL DESIGN; OPTICAL FIBER FABRICATION; PHOTOCHEMICAL REACTIONS; SPIN COATING; STRENGTH OF MATERIALS; THIN FILMS; TOUGHNESS; TRANSPARENCY; ULTRAVIOLET SPECTROSCOPY;

PHOTOCHEMICAL DARKENING;

PHOTOLITHOGRAPHY;

EID: 0035758688     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435710     Document Type: Article

References (14)

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13. This work is done in collaboration with Vladimir Liberman of MIT Lincoln Labs, and will be discussed in greater detail in a subsequent publication.
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