-
1
-
-
0032613606
-
Diffraction-limited laser beam shaping by use of computer-generated holograms with dislocations
-
Churin, E., "Diffraction-limited laser beam shaping by use of computer-generated holograms with dislocations," Optics Letters 24, 620-621 (1999). (Pubitemid 129306882)
-
(1999)
Optics Letters
, vol.24
, Issue.9
, pp. 620-621
-
-
Churin, E.G.1
-
2
-
-
0022256123
-
Testing aspheric surfaces with computer-generated holograms: Analysis of adjustment and shape errors
-
Tiziani, B., "Testing aspheric surfaces with computer-generated holograms: analysis of adjustment and shape errors," Applied Optics 24, 2604-2611 (1985).
-
(1985)
Applied Optics
, vol.24
, pp. 2604-2611
-
-
Tiziani, B.1
-
3
-
-
84975542815
-
Computer generated hologram, null lens test of aspheric wavefronts
-
Wyant, J. and O'Neill, P., "Computer generated hologram, Null lens test of aspheric wavefronts," Applied Optics 13, 2762-2765 (1974).
-
(1974)
Applied Optics
, vol.13
, pp. 2762-2765
-
-
Wyant, J.1
O'Neill, P.2
-
4
-
-
0031389573
-
Continuous profile writing by electron and optical lithography
-
PII S016793179700186X
-
Kley, E.-B., "Continuous profile writing by electron and optical lithography," Microelectronic Engineering 34, 261-298 (1997). (Pubitemid 127413216)
-
(1997)
Microelectronic Engineering
, vol.34
, Issue.3-4
, pp. 261-298
-
-
Kley, E.-B.1
-
5
-
-
0029727645
-
One step lithography for mass production of multilevel diffractive optical elements using high energy beam sensitive (HEBS) grey-level mask
-
Daschner, W., Long, P., Stein, R., Wu, C. and Lee, S., "One step lithography for mass production of multilevel diffractive optical elements using High Energy Beam Sensitive (HEBS) grey-level mask," Proc. SPIE 2689, 153-155 (1996).
-
(1996)
Proc. SPIE
, vol.2689
, pp. 153-155
-
-
Daschner, W.1
Long, P.2
Stein, R.3
Wu, C.4
Lee, S.5
-
6
-
-
0032632298
-
Adapting existing e-beam writers to write HEBS-glass gray scale masks
-
Kley, E.-B., Cumme, M., Wittig, L.-C. and Wu, C., "Adapting existing e-beam writers to write HEBS-glass gray scale masks," Proc. SPIE 3633, 35-45 (1999).
-
(1999)
Proc. SPIE
, vol.3633
, pp. 35-45
-
-
Kley, E.-B.1
Cumme, M.2
Wittig, L.-C.3
Wu, C.4
-
7
-
-
0035326281
-
Exposure characteristics and three-dimensional profiling of SU8C resist using electron beam lithography
-
DOI 10.1116/1.1368678
-
Wong, W. H. and Pun, E. Y. B., "Exposure characteristics and three-dimensional profiling of SU8C resist using electron beam lithography," Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 19, 732-735 (2001). (Pubitemid 32877837)
-
(2001)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.19
, Issue.3
, pp. 732-735
-
-
Wong, W.H.1
Pun, E.Y.B.2
-
8
-
-
0000577080
-
Multilayer technology for diffractive optical elements
-
Goebel, B., Wang, L. and Tschudi, T., "Multilayer technology for diffractive optical elements," Applied Optics 35, 4490-4493 (1996). (Pubitemid 126592789)
-
(1996)
Applied Optics
, vol.35
, Issue.22
, pp. 4490-4493
-
-
Goebel, B.1
Wang, L.L.2
Tschudi, T.3
-
9
-
-
0027588429
-
Multilevel-grating array generators: Fabrication error analysis and experiments
-
Miller, J. M., Taghizadeh, M. R., Turunen, J. and Ross, N., "Multilevel-grating array generators: fabrication error analysis and experiments," Applied Optics 32, 2519-2525 (1993).
-
(1993)
Applied Optics
, vol.32
, pp. 2519-2525
-
-
Miller, J.M.1
Taghizadeh, M.R.2
Turunen, J.3
Ross, N.4
-
10
-
-
84975635732
-
Binary gratings with increased efficiency
-
Farn, M., "Binary gratings with increased efficiency," Appl. Opt 31, 4453-4458 (1992).
-
(1992)
Appl. Opt.
, vol.31
, pp. 4453-4458
-
-
Farn, M.1
-
11
-
-
0001178803
-
High-efficiency subwavelength diffractive element patterned in a high-refractive-index material for 633 nm
-
Astilean, S., Lalanne, P., Chavel, P., Cambril, E. and Launois, H., "High-efficiency subwavelength diffractive element patterned in a high-refractive-index material for 633 nm," Optics Letters 23, 552-554 (1998). (Pubitemid 128563788)
-
(1998)
Optics Letters
, vol.23
, Issue.7
, pp. 552-554
-
-
Astilean, S.1
Lalanne, P.2
Chavel, P.3
Cambril, E.4
Launois, H.5
-
12
-
-
0029306643
-
Optimized binary, phase-only, diffractive optical element with subwavelength features for 1.55 μm
-
Zhou, Z. and Drabik, T., "Optimized binary, phase-only, diffractive optical element with subwavelength features for 1.55 μm," Journal of the Optical Society of America A 12, 1104-1112 (1995).
-
(1995)
Journal of the Optical Society of America A
, vol.12
, pp. 1104-1112
-
-
Zhou, Z.1
Drabik, T.2
-
13
-
-
35448992883
-
Deterministic design of binary phase-only blazed grating with subwavelength features under limitation on spatial resolution of fabrication technique
-
DOI 10.1364/AO.46.005019
-
Oonishi, T., Konishi, T. and Itoh, K., "Deterministic design of binary phase-only blazed grating with subwavelength features under limitation on spatial resolution of fabrication technique," Applied Optics 46, 5019-5026 (2007). (Pubitemid 47632058)
-
(2007)
Applied Optics
, vol.46
, Issue.22
, pp. 5019-5026
-
-
Oonishi, T.1
Konishi, T.2
Itoh, K.3
-
14
-
-
40149100320
-
Analysis of blazed diffractive optical elements formed with artificial dielectrics
-
DOI 10.1364/JOSAA.24.003819
-
Ribot, C., Lalanne, P., Lee, M., Loiseaux, B. and Huignard, J., "Analysis of blazed diffractive optical elements formed with artificial dielectrics," Journal of the Optical Society of America A 24, 3819-3826 (2007). (Pubitemid 351325151)
-
(2007)
Journal of the Optical Society of America A: Optics and Image Science, and Vision
, vol.24
, Issue.12
, pp. 3819-3826
-
-
Ribot, C.1
Lalanne, P.2
Lee, M.-S.-L.3
Loiseaux, B.4
Huignard, J.-P.5
-
15
-
-
0000249491
-
Blazed binary subwavelength gratings with efficiencies larger than those of conventional échelette gratings
-
Lalanne, P., Astilean, S., Chavel, P., Cambril, E. and Launois, H., "Blazed binary subwavelength gratings with efficiencies larger than those of conventional échelette gratings," Optics letters 23, 1081-1083 (1998). (Pubitemid 128589263)
-
(1998)
Optics Letters
, vol.23
, Issue.14
, pp. 1081-1083
-
-
Lalanne, P.1
Astilean, S.2
Chavel, P.3
Cambril, E.4
Launois, H.5
-
16
-
-
0036710782
-
Imaging with blazed-binary diffractive elements
-
Lee, M., Lalanne, P., Rodier, J., Chavel, P., Cambril, E. and Chen, Y., "Imaging with blazed-binary diffractive elements", Journal of Optics A Pure and Applied Optics 4, 119-124 (2002).
-
(2002)
Journal of Optics a Pure and Applied Optics
, vol.4
, pp. 119-124
-
-
Lee, M.1
Lalanne, P.2
Rodier, J.3
Chavel, P.4
Cambril, E.5
Chen, Y.6
-
17
-
-
0000765270
-
Diffractive lens fabricated with mostly zeroth-order gratings
-
Chen, F. and Craighead, H., "Diffractive lens fabricated with mostly zeroth-order gratings," Optics Letters 21, 177-179 (1996). (Pubitemid 126540150)
-
(1996)
Optics Letters
, vol.21
, Issue.3
, pp. 177-179
-
-
Chen, F.T.1
Craighead, H.G.2
-
18
-
-
0000187809
-
Design of binary subwavelength diffractive lenses by use of zeroth-order effective-medium theory
-
Mait, J., Prather, D. and Mirotznik, M., "Design of binary subwavelength diffractive lenses by use of zeroth-order effective-medium theory," Journal of the Optical Society of America A 16, 1157-1167 (1999). (Pubitemid 129655701)
-
(1999)
Journal of the Optical Society of America A: Optics and Image Science, and Vision
, vol.16
, Issue.5
, pp. 1157-1167
-
-
Mait, J.N.1
Prather, D.W.2
Mirotznik, M.S.3
-
19
-
-
0000384320
-
Diffractive lens fabricated with binary features less than 60 nm
-
Mait, J., Scherer, A., Dial, O., Prather, D. and Gao, X., "Diffractive lens fabricated with binary features less than 60 nm," Optics Letters 25, 381-383 (2000).
-
(2000)
Optics Letters
, vol.25
, pp. 381-383
-
-
Mait, J.1
Scherer, A.2
Dial, O.3
Prather, D.4
Gao, X.5
-
20
-
-
42549129900
-
A working method for prototyping solid immersion blazed-phase diffractive optics for near-infrared laser microscopy
-
Coyne, E. and Zachariasse, F., "A working method for prototyping solid immersion blazed-phase diffractive optics for near-infrared laser microscopy," Journal of Micromechanics and Microengineering 18, 45016-45016 (2008).
-
(2008)
Journal of Micromechanics and Microengineering
, vol.18
, pp. 45016-45016
-
-
Coyne, E.1
Zachariasse, F.2
-
21
-
-
0030261714
-
On the effective medium theory of subwavelength periodic structures
-
Lalanne, P. and Lemercier-Lalanne, D., "On the effective medium theory of subwavelength periodic structures," Journal of Modern Optics 43, 2063-2086 (1996).
-
(1996)
Journal of Modern Optics
, vol.43
, pp. 2063-2086
-
-
Lalanne, P.1
Lemercier-Lalanne, D.2
-
22
-
-
0001037185
-
Fabrication of multilevel phase computergenerated hologram elements based on effective medium theory
-
Yu, W., Takahara, K., Konishi, T., Yotsuya, T. and Ichioka, Y., "Fabrication of multilevel phase computergenerated hologram elements based on effective medium theory," Applied Optics 39, 3531-3536 (2000).
-
(2000)
Applied Optics
, vol.39
, pp. 3531-3536
-
-
Yu, W.1
Takahara, K.2
Konishi, T.3
Yotsuya, T.4
Ichioka, Y.5
-
23
-
-
77649196401
-
Design of binary subwavelength multiphase level computer generated holograms
-
Freese, W., Kämpfe, T., Kley, E.-B. and Tünnermann, A., "Design of binary subwavelength multiphase level computer generated holograms," Optics Letters 35, 676-678 (2010).
-
(2010)
Optics Letters
, vol.35
, pp. 676-678
-
-
Freese, W.1
Kämpfe, T.2
Kley, E.-B.3
Tünnermann, A.4
-
24
-
-
77951616315
-
Multi-phase-level diffractive elements realized by binary effective medium patterns
-
Freese, W., Kämpfe, T., Kley, E.-B. and Tünnermann, A., "Multi-phase-level diffractive elements realized by binary effective medium patterns," Proc. SPIE 7591, 75910Z (2010).
-
(2010)
Proc. SPIE
, vol.7591
-
-
Freese, W.1
Kämpfe, T.2
Kley, E.-B.3
Tünnermann, A.4
-
25
-
-
71849118442
-
Large-scale application of binary subwavelength structures
-
Kley, E.-B., Freese, W., Kämpfe, T., Tünnermann, A., Zeitner, U. D., Michaelis, D. and Erdmann, M., "Large-scale application of binary subwavelength structures", Proc. IEEE/LEOS, 148-149 (2009).
-
(2009)
Proc. IEEE/LEOS
, pp. 148-149
-
-
Kley, E.-B.1
Freese, W.2
Kämpfe, T.3
Tünnermann, A.4
Zeitner, U.D.5
Michaelis, D.6
Erdmann, M.7
-
26
-
-
79953717706
-
Creation of multicolor images by reflective, wavelength selective CGH
-
Kämpfe, T., Kley, E.-B., Dannberg, P., Hochenbleicher, G. and Tünnermann, A., "Creation of Multicolor Images by Reflective, Wavelength selective CGH", Proc. OSA DH (2007).
-
(2007)
Proc. OSA DH
-
-
Kämpfe, T.1
Kley, E.-B.2
Dannberg, P.3
Hochenbleicher, G.4
Tünnermann, A.5
-
27
-
-
1242327826
-
Digital holography as part of diffractive optics
-
Wyrowski, F. and Bryngdahl, O., "Digital holography as part of diffractive optics," Rep. Prog. in Physics 54, 1481-1571 (1991).
-
(1991)
Rep. Prog. in Physics
, vol.54
, pp. 1481-1571
-
-
Wyrowski, F.1
Bryngdahl, O.2
-
28
-
-
0032606441
-
Design and fabrication of blazed binary diffractive elements with sampling periods smaller than the structural cutoff
-
Lalanne, P., Astilean, S., Chavel, P., Cambril, E. and Launois, H., "Design and fabrication of blazed binary diffractive elements with sampling periods smaller than the structural cutoff,", Journal of the Optical Society of America A 16, 1143-1156 (1999). (Pubitemid 129305532)
-
(1999)
Journal of the Optical Society of America A: Optics and Image Science, and Vision
, vol.16
, Issue.5
, pp. 1143-1156
-
-
Lalanne, P.1
Astilean, S.2
Chavel, P.3
Cambril, E.4
Launois, H.5
-
29
-
-
0029307028
-
Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings
-
Moharam, M. G., Grann, E. B. and Pommet, D. A., "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," Journal of the Optical Society of America A 12, 1068-1076 (1995).
-
(1995)
Journal of the Optical Society of America A
, vol.12
, pp. 1068-1076
-
-
Moharam, M.G.1
Grann, E.B.2
Pommet, D.A.3
-
31
-
-
0016572881
-
Proximity effect in electron-beam lithography
-
Chang, T. H. P., "Proximity effect in electron-beam lithography," Journal of Vacuum Science and Technology 12, 1271-1275 (1975).
-
(1975)
Journal of Vacuum Science and Technology
, vol.12
, pp. 1271-1275
-
-
Chang, T.H.P.1
-
32
-
-
0034205516
-
Determination of proximity effect parameters and the shape bias parameter in electron beam lithography
-
Seo, E., Choi, B. K. and Kim, O., "Determination of proximity effect parameters and the shape bias parameter in electron beam lithography," Microelectronic Engineering 53, 305-308 (2000).
-
(2000)
Microelectronic Engineering
, vol.53
, pp. 305-308
-
-
Seo, E.1
Choi, B.K.2
Kim, O.3
|