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Volumn 7927, Issue , 2011, Pages

Design and fabrication of a highly off-axis binary multi-phase-level computer-generated hologram based on an effective medium approach

Author keywords

Binary subwavelength structures; Diffractive optics; Multilevel computer generated holograms

Indexed keywords

COMPUTER GENERATED HOLOGRAMS; DIFFRACTIVE ELEMENT; EFFECTIVE MEDIUM; ETCHING STEP; FABRICATION PROCESS; HIGH EFFICIENCY; LARGE DEVIATIONS; MODERN OPTICS; MULTILEVEL COMPUTER-GENERATED HOLOGRAMS; OFF-AXIS; PHASE LEVELS; PHASE PATTERNS; PHASE STEPS; SUB-WAVELENGTH STRUCTURES; SURFACE RELIEFS;

EID: 79953690210     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.875007     Document Type: Conference Paper
Times cited : (4)

References (32)
  • 1
    • 0032613606 scopus 로고    scopus 로고
    • Diffraction-limited laser beam shaping by use of computer-generated holograms with dislocations
    • Churin, E., "Diffraction-limited laser beam shaping by use of computer-generated holograms with dislocations," Optics Letters 24, 620-621 (1999). (Pubitemid 129306882)
    • (1999) Optics Letters , vol.24 , Issue.9 , pp. 620-621
    • Churin, E.G.1
  • 2
    • 0022256123 scopus 로고
    • Testing aspheric surfaces with computer-generated holograms: Analysis of adjustment and shape errors
    • Tiziani, B., "Testing aspheric surfaces with computer-generated holograms: analysis of adjustment and shape errors," Applied Optics 24, 2604-2611 (1985).
    • (1985) Applied Optics , vol.24 , pp. 2604-2611
    • Tiziani, B.1
  • 3
    • 84975542815 scopus 로고
    • Computer generated hologram, null lens test of aspheric wavefronts
    • Wyant, J. and O'Neill, P., "Computer generated hologram, Null lens test of aspheric wavefronts," Applied Optics 13, 2762-2765 (1974).
    • (1974) Applied Optics , vol.13 , pp. 2762-2765
    • Wyant, J.1    O'Neill, P.2
  • 4
    • 0031389573 scopus 로고    scopus 로고
    • Continuous profile writing by electron and optical lithography
    • PII S016793179700186X
    • Kley, E.-B., "Continuous profile writing by electron and optical lithography," Microelectronic Engineering 34, 261-298 (1997). (Pubitemid 127413216)
    • (1997) Microelectronic Engineering , vol.34 , Issue.3-4 , pp. 261-298
    • Kley, E.-B.1
  • 5
    • 0029727645 scopus 로고    scopus 로고
    • One step lithography for mass production of multilevel diffractive optical elements using high energy beam sensitive (HEBS) grey-level mask
    • Daschner, W., Long, P., Stein, R., Wu, C. and Lee, S., "One step lithography for mass production of multilevel diffractive optical elements using High Energy Beam Sensitive (HEBS) grey-level mask," Proc. SPIE 2689, 153-155 (1996).
    • (1996) Proc. SPIE , vol.2689 , pp. 153-155
    • Daschner, W.1    Long, P.2    Stein, R.3    Wu, C.4    Lee, S.5
  • 6
    • 0032632298 scopus 로고    scopus 로고
    • Adapting existing e-beam writers to write HEBS-glass gray scale masks
    • Kley, E.-B., Cumme, M., Wittig, L.-C. and Wu, C., "Adapting existing e-beam writers to write HEBS-glass gray scale masks," Proc. SPIE 3633, 35-45 (1999).
    • (1999) Proc. SPIE , vol.3633 , pp. 35-45
    • Kley, E.-B.1    Cumme, M.2    Wittig, L.-C.3    Wu, C.4
  • 7
    • 0035326281 scopus 로고    scopus 로고
    • Exposure characteristics and three-dimensional profiling of SU8C resist using electron beam lithography
    • DOI 10.1116/1.1368678
    • Wong, W. H. and Pun, E. Y. B., "Exposure characteristics and three-dimensional profiling of SU8C resist using electron beam lithography," Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 19, 732-735 (2001). (Pubitemid 32877837)
    • (2001) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.19 , Issue.3 , pp. 732-735
    • Wong, W.H.1    Pun, E.Y.B.2
  • 8
    • 0000577080 scopus 로고    scopus 로고
    • Multilayer technology for diffractive optical elements
    • Goebel, B., Wang, L. and Tschudi, T., "Multilayer technology for diffractive optical elements," Applied Optics 35, 4490-4493 (1996). (Pubitemid 126592789)
    • (1996) Applied Optics , vol.35 , Issue.22 , pp. 4490-4493
    • Goebel, B.1    Wang, L.L.2    Tschudi, T.3
  • 9
    • 0027588429 scopus 로고
    • Multilevel-grating array generators: Fabrication error analysis and experiments
    • Miller, J. M., Taghizadeh, M. R., Turunen, J. and Ross, N., "Multilevel-grating array generators: fabrication error analysis and experiments," Applied Optics 32, 2519-2525 (1993).
    • (1993) Applied Optics , vol.32 , pp. 2519-2525
    • Miller, J.M.1    Taghizadeh, M.R.2    Turunen, J.3    Ross, N.4
  • 10
    • 84975635732 scopus 로고
    • Binary gratings with increased efficiency
    • Farn, M., "Binary gratings with increased efficiency," Appl. Opt 31, 4453-4458 (1992).
    • (1992) Appl. Opt. , vol.31 , pp. 4453-4458
    • Farn, M.1
  • 11
    • 0001178803 scopus 로고    scopus 로고
    • High-efficiency subwavelength diffractive element patterned in a high-refractive-index material for 633 nm
    • Astilean, S., Lalanne, P., Chavel, P., Cambril, E. and Launois, H., "High-efficiency subwavelength diffractive element patterned in a high-refractive-index material for 633 nm," Optics Letters 23, 552-554 (1998). (Pubitemid 128563788)
    • (1998) Optics Letters , vol.23 , Issue.7 , pp. 552-554
    • Astilean, S.1    Lalanne, P.2    Chavel, P.3    Cambril, E.4    Launois, H.5
  • 12
    • 0029306643 scopus 로고
    • Optimized binary, phase-only, diffractive optical element with subwavelength features for 1.55 μm
    • Zhou, Z. and Drabik, T., "Optimized binary, phase-only, diffractive optical element with subwavelength features for 1.55 μm," Journal of the Optical Society of America A 12, 1104-1112 (1995).
    • (1995) Journal of the Optical Society of America A , vol.12 , pp. 1104-1112
    • Zhou, Z.1    Drabik, T.2
  • 13
    • 35448992883 scopus 로고    scopus 로고
    • Deterministic design of binary phase-only blazed grating with subwavelength features under limitation on spatial resolution of fabrication technique
    • DOI 10.1364/AO.46.005019
    • Oonishi, T., Konishi, T. and Itoh, K., "Deterministic design of binary phase-only blazed grating with subwavelength features under limitation on spatial resolution of fabrication technique," Applied Optics 46, 5019-5026 (2007). (Pubitemid 47632058)
    • (2007) Applied Optics , vol.46 , Issue.22 , pp. 5019-5026
    • Oonishi, T.1    Konishi, T.2    Itoh, K.3
  • 15
    • 0000249491 scopus 로고    scopus 로고
    • Blazed binary subwavelength gratings with efficiencies larger than those of conventional échelette gratings
    • Lalanne, P., Astilean, S., Chavel, P., Cambril, E. and Launois, H., "Blazed binary subwavelength gratings with efficiencies larger than those of conventional échelette gratings," Optics letters 23, 1081-1083 (1998). (Pubitemid 128589263)
    • (1998) Optics Letters , vol.23 , Issue.14 , pp. 1081-1083
    • Lalanne, P.1    Astilean, S.2    Chavel, P.3    Cambril, E.4    Launois, H.5
  • 17
    • 0000765270 scopus 로고    scopus 로고
    • Diffractive lens fabricated with mostly zeroth-order gratings
    • Chen, F. and Craighead, H., "Diffractive lens fabricated with mostly zeroth-order gratings," Optics Letters 21, 177-179 (1996). (Pubitemid 126540150)
    • (1996) Optics Letters , vol.21 , Issue.3 , pp. 177-179
    • Chen, F.T.1    Craighead, H.G.2
  • 19
    • 0000384320 scopus 로고    scopus 로고
    • Diffractive lens fabricated with binary features less than 60 nm
    • Mait, J., Scherer, A., Dial, O., Prather, D. and Gao, X., "Diffractive lens fabricated with binary features less than 60 nm," Optics Letters 25, 381-383 (2000).
    • (2000) Optics Letters , vol.25 , pp. 381-383
    • Mait, J.1    Scherer, A.2    Dial, O.3    Prather, D.4    Gao, X.5
  • 20
    • 42549129900 scopus 로고    scopus 로고
    • A working method for prototyping solid immersion blazed-phase diffractive optics for near-infrared laser microscopy
    • Coyne, E. and Zachariasse, F., "A working method for prototyping solid immersion blazed-phase diffractive optics for near-infrared laser microscopy," Journal of Micromechanics and Microengineering 18, 45016-45016 (2008).
    • (2008) Journal of Micromechanics and Microengineering , vol.18 , pp. 45016-45016
    • Coyne, E.1    Zachariasse, F.2
  • 21
    • 0030261714 scopus 로고    scopus 로고
    • On the effective medium theory of subwavelength periodic structures
    • Lalanne, P. and Lemercier-Lalanne, D., "On the effective medium theory of subwavelength periodic structures," Journal of Modern Optics 43, 2063-2086 (1996).
    • (1996) Journal of Modern Optics , vol.43 , pp. 2063-2086
    • Lalanne, P.1    Lemercier-Lalanne, D.2
  • 22
    • 0001037185 scopus 로고    scopus 로고
    • Fabrication of multilevel phase computergenerated hologram elements based on effective medium theory
    • Yu, W., Takahara, K., Konishi, T., Yotsuya, T. and Ichioka, Y., "Fabrication of multilevel phase computergenerated hologram elements based on effective medium theory," Applied Optics 39, 3531-3536 (2000).
    • (2000) Applied Optics , vol.39 , pp. 3531-3536
    • Yu, W.1    Takahara, K.2    Konishi, T.3    Yotsuya, T.4    Ichioka, Y.5
  • 23
    • 77649196401 scopus 로고    scopus 로고
    • Design of binary subwavelength multiphase level computer generated holograms
    • Freese, W., Kämpfe, T., Kley, E.-B. and Tünnermann, A., "Design of binary subwavelength multiphase level computer generated holograms," Optics Letters 35, 676-678 (2010).
    • (2010) Optics Letters , vol.35 , pp. 676-678
    • Freese, W.1    Kämpfe, T.2    Kley, E.-B.3    Tünnermann, A.4
  • 24
    • 77951616315 scopus 로고    scopus 로고
    • Multi-phase-level diffractive elements realized by binary effective medium patterns
    • Freese, W., Kämpfe, T., Kley, E.-B. and Tünnermann, A., "Multi-phase-level diffractive elements realized by binary effective medium patterns," Proc. SPIE 7591, 75910Z (2010).
    • (2010) Proc. SPIE , vol.7591
    • Freese, W.1    Kämpfe, T.2    Kley, E.-B.3    Tünnermann, A.4
  • 27
    • 1242327826 scopus 로고
    • Digital holography as part of diffractive optics
    • Wyrowski, F. and Bryngdahl, O., "Digital holography as part of diffractive optics," Rep. Prog. in Physics 54, 1481-1571 (1991).
    • (1991) Rep. Prog. in Physics , vol.54 , pp. 1481-1571
    • Wyrowski, F.1    Bryngdahl, O.2
  • 29
    • 0029307028 scopus 로고
    • Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings
    • Moharam, M. G., Grann, E. B. and Pommet, D. A., "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," Journal of the Optical Society of America A 12, 1068-1076 (1995).
    • (1995) Journal of the Optical Society of America A , vol.12 , pp. 1068-1076
    • Moharam, M.G.1    Grann, E.B.2    Pommet, D.A.3
  • 31
    • 0016572881 scopus 로고
    • Proximity effect in electron-beam lithography
    • Chang, T. H. P., "Proximity effect in electron-beam lithography," Journal of Vacuum Science and Technology 12, 1271-1275 (1975).
    • (1975) Journal of Vacuum Science and Technology , vol.12 , pp. 1271-1275
    • Chang, T.H.P.1
  • 32
    • 0034205516 scopus 로고    scopus 로고
    • Determination of proximity effect parameters and the shape bias parameter in electron beam lithography
    • Seo, E., Choi, B. K. and Kim, O., "Determination of proximity effect parameters and the shape bias parameter in electron beam lithography," Microelectronic Engineering 53, 305-308 (2000).
    • (2000) Microelectronic Engineering , vol.53 , pp. 305-308
    • Seo, E.1    Choi, B.K.2    Kim, O.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.