Adapting existing e-beam writers to write HEBS-glass gray scale masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3633, Issue , 1999, Pages 35-45

  Kley, E Bernhard ^a   Cumme, Matthias ^a   Wittig, Lars Christian ^a   Wu, Chuck ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; HOLOGRAPHIC OPTICAL ELEMENTS; MASKS; OPTICAL GLASS; THERMAL EFFECTS;

GAUSSIAN BEAMS; HIGH DENSITY BEAM SENSITIVE GLASS; VARIABLE SHAPE ELECTRON BEAM WRITER;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032632298     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)