Large-scale application of binary subwavelength structures

2009 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPTMEMS 2009

Volumn , Issue , 2009, Pages 148-149

  Kley, E B ^a   Freese, W ^a   Kampfe T ^a   Tunnermann A ^a   Zeitner, U D ^b   Michaelis, D ^b   Erdmann, M ^c  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^c EUROPEAN SPACE AGENCY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE ELEMENT; LARGE-SCALE APPLICATIONS; SUB-WAVELENGTH STRUCTURES; WAVEFRONT ERRORS;

MEMS; MICROELECTROMECHANICAL DEVICES; NANOPHOTONICS; REACTIVE ION ETCHING;

PHOTONICS;

EID: 71849118442     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/OMEMS.2009.5338618     Document Type: Conference Paper

References (9)

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