Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect

Nanotechnology

Volumn 22, Issue 18, 2011, Pages

  Meng, Fantao ^a,b   Luo, Gang ^c   Maximov, Ivan ^b   Montelius, Lars ^b   Zhou, Ye ^c   Nilsson, Lars ^d   Carlberg, Patrick ^c   Heidari, Babak ^c   Chu, Jinkui ^a   Xu, H Q ^b  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b LUND UNIVERSITY   (Sweden)

^c Box 580   (Sweden)

^d LUND UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ANTISTICKING LAYERS; BEFORE AND AFTER; CLEANING METHODS; CLEANING PROCESS; DEMOLDING; EFFICIENT METHOD; HIGH-THROUGHPUT; IMPRINTING PROCESS; NANOIMPRINT STAMPS; NM RESOLUTION; POLYMER SUBSTRATE; RESIDUAL RESISTS; SELF-CLEANING EFFECTS; SUBSTRATE CLEANING; ULTRA-VIOLET;

CONTACT ANGLE; CONTAMINATION; NANOIMPRINT LITHOGRAPHY; ORGANIC SOLVENTS; SUBSTRATES;

CLEANING;

EID: 79953271908     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/18/185301     Document Type: Article

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