Use of electrochemical deposition to create randomly rough surfaces and roughness gradients

Langmuir

Volumn 27, Issue 7, 2011, Pages 3261-3265

  Venkatasubramanian, Rajesh ^a   Jin, Kejia ^a   Pesika, Noshir S ^a  

^a Tulane University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROLLED DEPOSITION; ELECTROCHEMICAL DEPOSITION; ISLAND NUCLEATION; POTENTIAL RANGE; RANDOMLY ROUGH SURFACES;

DEPOSITION; ELECTROCHEMISTRY; ELECTRODEPOSITION; METAL ANALYSIS; NUCLEATION; REDUCTION; SILVER; SURFACE MEASUREMENT; SURFACE PROPERTIES;

SURFACE ROUGHNESS;

EID: 79953249184     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la200245m     Document Type: Article

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