The effects of surface roughness and nanostructure on the properties of indium tin oxide (ITO) designated for novel optoelectronic devices fabrication

Journal of Materials Processing Technology

Volumn 208, Issue 1-3, 2008, Pages 514-519

  Kavei, G ^a   Gheidari, A Mohammadi ^a  

^a MATERIALS AND ENERGY RESEARCH CENTER   (Iran)

Author keywords

Atomic force microscopy (AFM); Q quality factor; Scanning probe microscopy (SPM); Surface roughness

Indexed keywords

ANNEALING; CONDUCTIVE FILMS; ELECTRIC CONDUCTIVITY; FRICTION; GLASS; IMAGING TECHNIQUES; INDIUM; METAL ANALYSIS; MICROSCOPIC EXAMINATION; OPTICAL CONDUCTIVITY; OPTICAL DESIGN; OPTOELECTRONIC DEVICES; SPUTTER DEPOSITION; SPUTTERING; SURFACE PROPERTIES; SURFACE ROUGHNESS; TIN; TITANIUM COMPOUNDS;

ANNEALING PROCESSING; ATOMIC FORCE; ATOMIC FORCE MICROSCOPY (AFM); BEFORE AND AFTER; ELECTRICAL CONDUCTIVITY; INDIUM-TIN OXIDE; INTRINSIC PARAMETERS; NANO STRUCTURING; OPTICAL TRANSMITTANCE; Q QUALITY FACTOR; RATE OF DEPOSITION; RF SPUTTERING SYSTEM; ROOM TEMPERATURES; SCANNING PROBE MICROSCOPY (SPM); SCANNING-PROBE MICROSCOPY; SODA-LIME GLASS; SPUTTERING GAS PRESSURE; SPUTTERING GASES; SPUTTERING RATES;

SURFACE STRUCTURE;

EID: 52949097627     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2008.01.024     Document Type: Article

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