Evolution of surface width in electrochemical nucleation and growth

Electrochemistry Communications

Volumn 12, Issue 3, 2010, Pages 431-434

  Guo, Lian ^a   Searson, Peter C ^a  

^a Johns Hopkins University   (United States)

Author keywords

Copper deposition; Dynamic scaling; Electrodeposition; Kinetic roughening; Nucleation and growth

Indexed keywords

COPPER DEPOSITION; ELECTROCHEMICAL NUCLEATION; ELECTRODEPOSITION KINETICS; FILM ROUGHNESS; ISLAND DENSITY; ISLAND GROWTH; ISLAND SHAPE; KINETIC REGIME; NUCLEATION AND GROWTH;

COALESCENCE; COPPER; COPPER PLATING; ELECTRODEPOSITION; GROWTH KINETICS; NUCLEATION; SURFACE ROUGHNESS;

FILM GROWTH;

EID: 76449091822     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2010.01.011     Document Type: Article

References (16)

1. Guo L., Zhang S.L., and Searson P. Physical Review E 79 (2009) 051601
2. Guo L., Radisic A., and Searson P.C. Journal of the Electrochemical Society 153 (2006) C840
3. Family F., and Vicsek T. Journal of Physics a-Mathematical and General 18 (1985) L75
4. F. Family and T. Vicsek, Dynamics of fractal surfaces, World Scientific, Singapore, 1991.
5. Meakin P. Fractals scaling and growth far from equilibrium (1998), Cambridge University Press, Cambridge, U.K.; New York
6. Iwamoto A., Yoshinobu T., and Iwasaki H. Physical Review Letters 72 (1994) 4025
7. Mendez S., Andreasen G., Schilardi P., Figueroa M., Vazquez L., Salvarezza R.C., and Arvia A.J. Langmuir 14 (1998) 2515
8. Schmidt W.U., Alkire R.C., and Gewirth A.A. Journal of the Electrochemical Society 143 (1996) 3122
9. Huo S., and Schwarzacher W. Physical Review Letters 86 (2001) 256
10. Wu A., and Barkey D.P. Journal of the Electrochemical Society 150 (2003) C533
11. Santamaria J., Gomez M.E., Vicent J.L., Krishnan K.M., and Schuller I.K. Physical Review Letters 89 (2002)
12. Yang H.N., Wang G.C., and Lu T.M. Physical Review Letters 73 (1994) 2348
13. Jeffries J.H., Zuo J.K., and Craig M.M. Physical Review Letters 76 (1996) 4931
14. Pelliccione M., Karabacak T., and Lu T.M. Physical Review Letters 96 (2006) 146105
15. Karabacak T., Zhao Y.P., Wang G.C., and Lu T.M. Physical Review B 6408 (2001) 085323
16. Fletcher S., and Matthews D.B. Journal of Applied Electrochemistry 11 (1981) 1