Superhydrophobic polytetrafluoroethylene thin films with hierarchical roughness deposited using a single step vapor phase technique

Thin Solid Films

Volumn 517, Issue 16, 2009, Pages 4555-4559

  Gupta, Sushant ^a   Arjunan, Arul Chakkaravarthi ^b   Deshpande, Sameer ^c   Seal, Sudipta ^c   Singh, Deepika ^b   Singh, Rajiv K ^a  

^a University of Florida   (United States)

^b Sinmat Inc   (United States)

^c UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

Atomic force microscopy; Dual scale roughness; Polytetrafluoroethylene; Pulsed electron deposition; Superhydrophobicity; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPES; BEAM ENERGIES; DEPOSITED FILMS; DUAL-SCALE ROUGHNESS; ELECTRON DEPOSITIONS; ELECTRON PENETRATION DEPTHS; POLYTETRAFLUOROETHYLENE FILMS; PULSED ELECTRON DEPOSITION; SCANNING ELECTRONS; SINGLE STEPS; SUB MICRONS; SUPER-HYDROPHOBIC; SUPERHYDROPHOBICITY; SURFACE INTERFACES; VAPOR-PHASE;

ATOMIC FORCE MICROSCOPY; ATOMS; CONTACT ANGLE; ELECTRON SOURCES; ELECTRONS; PHASE INTERFACES; SURFACE ROUGHNESS; THIN FILMS;

HYDROPHOBICITY;

EID: 67349085471     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.12.048     Document Type: Article

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