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Volumn 158, Issue 5, 2011, Pages

Growth and characterization of AlN and AlGaN epitaxial films on AlN single crystal substrates

(12) Dalmau, R a Moody, B a Schlesser, R a Mita, S a Xie, J a Feneberg, M b Neuschl, B b Thonke, K b Collazo, R c Rice, A c Tweedie, J c Sitar, Z c

a HexaTech Inc (United States)

b UNIVERSITY OF ULM (Germany)

c North Carolina State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGAN; ALN; ALN SINGLE CRYSTALS; ALN SUBSTRATES; HIGH-CRYSTALLINE QUALITY; METALORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL CHARACTERIZATION; PHYSICAL VAPOR TRANSPORT;

EPITAXIAL GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANOMETALLICS; SINGLE CRYSTALS;

EPITAXIAL FILMS;

EID: 79953232044 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3560527 Document Type: Article

Times cited : (124)

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