Photoluminescence properties of AlN homoepilayers with different orientations

Applied Physics Letters

Volumn 93, Issue 4, 2008, Pages

  Sedhain, A ^a   Nepal, N ^a   Nakarmi, M L ^a   Al Tahtamouni, T M ^a   Lin, J Y ^b   Jiang, H X ^b   Gu, Z ^c   Edgar, J H ^c  

^a KANSAS STATE UNIVERSITY   (United States)

^b Department of Electrical and Computer Engineering   (United States)

^c Sunflower Networking Group   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CORUNDUM; ENERGY GAP; EPITAXIAL GROWTH; GALLIUM ALLOYS; LIGHT EMISSION; LUMINESCENCE; METALS; ORGANIC CHEMICALS; ORGANIC COMPOUNDS; ORGANOMETALLICS; PHOTOLUMINESCENCE; SAPPHIRE;

A-PLANE; BAND GAPS; COMPARATIVE STUDIES; DEEP UV; EMISSION INTENSITIES; M-PLANE; METAL-ORGANIC CHEMICAL VAPOR DEPOSITION; NEW GENERATION; NON-POLAR; ORDERS-OF-MAGNITUDE; PHOTOLUMINESCENCE PROPERTIES; PHOTONIC DEVICES; SAPPHIRE SUBSTRATES; STRAIN-FREE;

ION BEAM ASSISTED DEPOSITION;

EID: 49149103741     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2965613     Document Type: Article

References (19)

1. K. Dovidenko, S. Oktyabrsky, J. Narayan, and M. Razeghi, J. Appl. Phys. 79, 2439 (1996).
2. Y. Taniyasu, M. Kasu, and T. Makomoto, Nature (London) 441, 325 (2006).
3. J. Li, Z. Y. Fan, R. Dahal, M. L. Nakarmi, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 89, 213510 (2006).
4. R. Dahal, T. M. Al Tahtamouni, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 91, 243503 (2007).
5. M. A. Khan, R. A. Skogman, J. M. Van Hove, S. Krishnankutty, and R. M. Kolbas, Appl. Phys. Lett. 56, 1257 (1990).
6. S. Nakamura, T. Mukai, M. Senoh, S. Nagahama, and N. Iwasa, J. Appl. Phys. 74, 3911 (1993).
7. F. A. Ponce and D. P. Bour, Nature (London) 386, 351 (1997).
8. F. Bernardini, V. Fiorentini, and D. Vanderbilt, Phys. Rev. B 56, R10024 (1997).
9. H. M. Ng, Appl. Phys. Lett. 80, 4369 (2002).
10. T. M. Al Tahtamouni, A. Sedhain, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 90, 221105 (2007).
11. T. J. Baker, B. A. Haskell, F. Wu, P. T. Fini, J. S. Speck, and S. Nakamura, Jpn. J. Appl. Phys., Part 2 44, L920 (2005).
12. Z. Gu, L. Du, J. H. Edgar, N. Nepal, J. Y. Lin, H. X. Jiang, and R. Witt, J. Cryst. Growth 297, 105 (2006).
13. D. Zhang, J. H. Edgar, B. Liu, H. E. Huey, H. X. Jiang, J. Y. Lin, M. Kuball, F. Mogal, J. Chaudhuri, and Z. Rek, J. Cryst. Growth 262, 89 (2004).
14. P. B. Perry and R. F. Rutz, Appl. Phys. Lett. 33, 319 (1978).
15. M. Bickermann, B. M. Epelbaum, and A. Winnacker, Phys. Status Solidi C 0, 7 (2003).
16. N. Nepal, M. L. Nakarmi, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 89, 092107 (2006).
17. P. Lu, R. Collazo, R. Dalmau, X. Li, J. Tweedie, and Z. Sitar, MRS Symposia No. 1040E (Materials Research Society, Pittsburgh, 2007).
18. B. N. Pantha, N. Nepal, T. M. Al Tahtamouni, M. L. Nakarmi, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 91, 121117 (2007).
19. K. B. Nam, J. Li, M. L. Nakarmi, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 84, 5264 (2004).