-
1
-
-
6644225001
-
Submicron scaling of HBTs
-
DOI 10.1109/16.960387, PII S0018938301090724, Biopolar Transistor Technology: Past and Future Trends
-
M. J. W. Rodwell, M. Urteaga, Y. Bester, T. Mathew, D. Scott, D. Mensa, Q. Lee, J. Guthrie, Y. Betser, S. C. Martin, R. P. Smith, S. Jaganathan, S. Krishnan, S. I. Long, R. Pullela, and B. Agarwal, "Submicron scaling of HBTs," IEEE Trans. Electron Devices, vol. 48, no. 11, pp. 2606-2624, Nov. 2001. (Pubitemid 33105918)
-
(2001)
IEEE Transactions on Electron Devices
, vol.48
, Issue.11
, pp. 2606-2624
-
-
Rodwell, M.J.W.1
Urteaga, M.2
Mathew, T.3
Scott, D.4
Mensa, D.5
Lee, Q.6
Guthrie, J.7
Betser, Y.8
Martin, S.C.9
Smith, R.P.10
Jaganathan, S.11
Krishnan, S.12
Long, S.I.13
Pullela, R.14
Agarwal, B.15
Bhattacharya, U.16
Samoska, L.17
Dahlstrom, M.18
-
2
-
-
0035718688
-
2
-
M. Ida, K. Kurishima, N. Watanabe, and T. Enoki, "InP/InGaAs DHBTs with 341-GHz fT at high current density of over 800 kA/cm2," in IEDM Tech. Dig., Washington, DC, 2001, pp. 776-779. (Pubitemid 34170695)
-
(2001)
Technical Digest - International Electron Devices Meeting
, pp. 776-779
-
-
Ida, M.1
Kurishima, K.2
Watanabe, N.3
Enoki, T.4
-
3
-
-
79953042885
-
Design, construction, and high-frequency performance of drift transistors
-
Mar.
-
A. Kestenbaum and N. Ditrick, "Design, construction, and high-frequency performance of drift transistors," RCA Rev., vol. 18, pp. 12-23, Mar. 1958.
-
(1958)
RCA Rev.
, vol.18
, pp. 12-23
-
-
Kestenbaum, A.1
Ditrick, N.2
-
5
-
-
46049083609
-
Pseudomorphic InP/InGaAs heterojunction bipolar transistors (PHBTs) experimentally demonstrating fT = 765 GHz at 25 C increasing to fT = 845 GHz at 55 C
-
Dec.
-
W. Snodgrass, W. Hafez, N. Harff, and M. Feng, "Pseudomorphic InP/InGaAs heterojunction bipolar transistors (PHBTs) experimentally demonstrating fT = 765 GHz at 25 C increasing to fT = 845 GHz at 55 C," in IEDM Tech. Dig., San Francisco, CA, Dec. 2006, pp. 11-13.
-
(2006)
IEDM Tech. Dig., San Francisco, CA
, pp. 11-13
-
-
Snodgrass, W.1
Hafez, W.2
Harff, N.3
Feng, M.4
-
6
-
-
55849139613
-
InP bipolar ICs: Scaling roadmaps, frequency limits, manufacturable technologies
-
Feb.
-
M. Rodwell, M. Le, and B. Brar, "InP bipolar ICs: Scaling roadmaps, frequency limits, manufacturable technologies," Proc. IEEE, vol. 96, no. 2, pp. 271-286, Feb. 2008.
-
(2008)
Proc. IEEE
, vol.96
, Issue.2
, pp. 271-286
-
-
Rodwell, M.1
Le, M.2
Brar, B.3
-
7
-
-
33847129587
-
Minimum emitter charging time for heterojunction bipolar transistors
-
1634181, 2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings
-
N. Machida, Y. Miyamoto, and K. Furuya, "Minimum emitter charging time for heterojunction bipolar transistors," in Proc. Int. Conf. Indium Phosphide Related Mater., Princeton, NJ, 2006, pp. 325-328. (Pubitemid 46287456)
-
(2006)
Conference Proceedings - International Conference on Indium Phosphide and Related Materials
, vol.2006
, pp. 325-328
-
-
Machida, N.1
Miyamoto, Y.2
Furuya, K.3
-
8
-
-
6244304433
-
Tunneling in a finite superlattice
-
Jun.
-
R. Tsu and L. Esaki, "Tunneling in a finite superlattice," Appl. Phys. Lett., vol. 22, no. 11, pp. 562-564, Jun. 1973.
-
(1973)
Appl. Phys. Lett.
, vol.22
, Issue.11
, pp. 562-564
-
-
Tsu, R.1
Esaki, L.2
-
9
-
-
79953045966
-
Dilogarithm
-
Apr. 24 [Online]
-
E.W.Weisstein, "Dilogarithm," MathWorld-AWolframWeb Resource, Apr. 24, 2006. [Online]. Available: http://mathworld.wolfram.com/ Dilogarithm.html
-
(2006)
MathWorld-AWolframWeb Resource
-
-
Weisstein, E.W.1
-
11
-
-
0032624230
-
Reduction of the base-collector capacitance in InP/GaInAs heterojunction bipolar transistors due to electron velocity modulation
-
Apr.
-
Y. Betser and D. Ritter, "Reduction of the base-collector capacitance in InP/GaInAs heterojunction bipolar transistors due to electron velocity modulation," IEEE Trans. Electron Devices, vol. 16, no. 4, pp. 628-633, Apr. 1999.
-
(1999)
IEEE Trans. Electron Devices
, vol.16
, Issue.4
, pp. 628-633
-
-
Betser, Y.1
Ritter, D.2
-
12
-
-
70349509930
-
200-nm InGaAs/InP type i DHBT employing a dual-sidewall emitter process demonstrating fmax > 800 GHz and fτ = 360 GHz
-
Newport Beach, CA
-
E. Lobisser, Z. Griffith, V. Jain, B. J. Thibeault, and M. J. W. Rodwell, "200-nm InGaAs/InP type I DHBT employing a dual-sidewall emitter process demonstrating fmax > 800 GHz and fτ = 360 GHz," in Proc. Int. Conf. Indium Phosphide Related Mater., Newport Beach, CA, 2009, pp. 16-19.
-
(2009)
Proc. Int. Conf. Indium Phosphide Related Mater.
, pp. 16-19
-
-
Lobisser, E.1
Griffith, Z.2
Jain, V.3
Thibeault, B.J.4
Rodwell, M.J.W.5
-
13
-
-
77955654385
-
60 nmcollector InGaAs/InP type-I DHBTs demonstrating 660 GHz fτ, BVCEO = 2.5 V, and BVCBO = 2.7 v
-
San Antonio, TX
-
Z. Griffith, E. Lind, M. Rodwell, X. Fang, D. Loubychev, Y. Wu, J. Fastenau, and A. Liu, "60 nmcollector InGaAs/InP type-I DHBTs demonstrating 660 GHz fτ, BVCEO = 2.5 V, and BVCBO = 2.7 V," in Proc. IEEE Compd. Semicond. IC Symp., San Antonio, TX, 2006, pp. 12-15.
-
(2006)
Proc. IEEE Compd. Semicond. IC Symp.
, pp. 12-15
-
-
Griffith, Z.1
Lind, E.2
Rodwell, M.3
Fang, X.4
Loubychev, D.5
Wu, Y.6
Fastenau, J.7
Liu, A.8
-
14
-
-
77955501446
-
Fabrication of vertical In-GaAs channelmetal-insulator-semiconductor field effect transistor with a 15-nm-wide mesa structure and a drain current density of 7 MA/cm2
-
Jul.
-
H. Saito, Y. Miyamoto, and K. Furuya, "Fabrication of vertical In-GaAs channelmetal-insulator-semiconductor field effect transistor with a 15-nm-wide mesa structure and a drain current density of 7 MA/cm2," Appl. Phys. Exp., vol. 3, no. 8, p. 084 101, Jul. 2010.
-
(2010)
Appl. Phys. Exp.
, vol.3
, Issue.8
, pp. 084-101
-
-
Saito, H.1
Miyamoto, Y.2
Furuya, K.3
-
15
-
-
68349127560
-
Ultralow resistance, nonalloyed ohmic contacts to n-InGaAs
-
Jul.
-
A. Baraskar, M. Wistey, V. Jain, U. Singisetti, G. Burek, B. Thibeault, Y. Lee, A. Gossard, and M. Rodwell, "Ultralow resistance, nonalloyed ohmic contacts to n-InGaAs," J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct., vol. 27, no. 4, pp. 2036-2039, Jul. 2009.
-
(2009)
J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct.
, vol.27
, Issue.4
, pp. 2036-2039
-
-
Baraskar, A.1
Wistey, M.2
Jain, V.3
Singisetti, U.4
Burek, G.5
Thibeault, B.6
Lee, Y.7
Gossard, A.8
Rodwell, M.9
-
16
-
-
0035507073
-
Nonequilibrium electron transport in HBTs
-
DOI 10.1109/16.960386, PII S0018938301090712, Biopolar Transistor Technology: Past and Future Trends
-
T. Ishibashi, "Nonequilibrium electron transport in HBTs," IEEE Trans. Electron Devices, vol. 48, no. 11, pp. 2595-2605, Nov. 2001. (Pubitemid 33105917)
-
(2001)
IEEE Transactions on Electron Devices
, vol.48
, Issue.11
, pp. 2595-2605
-
-
Ishibashi, T.1
|