Hyperthermal oxygen interacting with silicon surfaces: Adsorption, implantation, and damage creation

Journal of Physical Chemistry C

Volumn 115, Issue 11, 2011, Pages 4818-4823

  Neyts, E C ^a   Khalilov, U ^a   Pourtois, G ^a,b   Van Duin, A C T ^c  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b IMEC   (Belgium)

^c The Pennsylvania State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT FORMATION; DEVICE PERFORMANCE; HIGH IMPACT ENERGY; IMPACT ENERGY; LOW ENERGIES; LOW IMPACT ENERGY; MOLECULAR DYNAMICS SIMULATIONS; PHOTOVOLTAIC DEVICES; SI(1 0 0); SILICON SURFACES;

ADSORPTION; CHEMISORPTION; MICROELECTRONICS; MOLECULAR DYNAMICS; MOLECULAR OXYGEN; PHOTOVOLTAIC EFFECTS; SILICA; SURFACE DEFECTS;

PROBABILITY DISTRIBUTIONS;

EID: 79952840771     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp112068z     Document Type: Article

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