Carbon-nanotube-templated microfabrication of porous silicon-carbon materials with application to chemical separations

Advanced Functional Materials

Volumn 21, Issue 6, 2011, Pages 1132-1139

  Song, Jun ^a   Jensen, David S ^a   Hutchison, David N ^a   Turner, Brendan ^a   Wood, Taylor ^a   Dadson, Andrew ^b   Vail, Michael A ^b   Linford, Matthew R ^a   Vanfleet, Richard R ^a   Davis, Robert C ^a  

^a Brigham Young University   (United States)

^b US Synthetic Corporation   (United States)

Author keywords

Carbon nanotubes; Chemical vapor deposition (CVD); Electron energy loss spectroscopy (EELS); Silicon nanowires; Thin layer chromatography

Indexed keywords

ANALYTES; CARBON MATERIAL; CHEMICAL INFILTRATION; CHEMICAL SEPARATION; CHEMICAL VAPOR; ELECTRON ENERGY-LOSS SPECTROSCOPY (EELS); HIERARCHICAL STRUCTURING; LITHOGRAPHIC PATTERNING; M-SCALE; MICRO-SCALES; MICROSCALE CHANNEL; NANO-SCALE POROSITY; NANOSCALE DIMENSIONS; NANOTUBE STRUCTURE; ROBUST MATERIALS; SILICON NANOWIRES; STRUCTURED MEDIA; TEMPLATED; THIN LAYERS;

CARBON NANOTUBES; DISSOCIATION; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; MICROANALYSIS; MICROFABRICATION; MICROMACHINING; NANOSTRUCTURED MATERIALS; NANOWIRES; POROUS SILICON; THIN LAYER CHROMATOGRAPHY;

CHEMICAL VAPOR DEPOSITION;

EID: 79952820116     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201001851     Document Type: Article

References (37)

1. B. Q. Wei, R. Vajtai, Y. Jung, J. Ward, R. Zhang, G. Ramanath, P. M. Ajayan, Nature 2002, 416, 495.
2. S. R. Quake, A. Scherer, Science 2000, 290, 1536.
3. J. Erlebacher, M. J. Aziz, A. Karma, N. Dimitrov, K. Sieradzki, Nature 2001, 410, 450.
4. P. R. Bandaru, J. Mater. Sci. 2007, 42, 1809.
5. Z. G. Wu, J. B. Neaton, J. C. Grossman, Nano Lett. 2009, 9, 2418.
6. W. Wang, P. N. Kumta, ACS Nano 2010, 4, 2233.
7. J. W. Coburn, H. F. Winters, Annu. Rev. Mater. Sci. 1983, 13, 91.
8. F. Marty, L. Rousseau, B. Saadany, B. Mercier, O. Franàais, Y. Mita, T. Bourouina, Microelectron. J. 2005, 36, 673
9. S. Fan, M. G. Chapline, N. R. Franklin, T. W. Tombler, A. M. Cassell, H. J. Dai, Science 1999, 283, 512.
10. K. Hata, D. N. Futaba, K. Mizuno, T. Namai, M. Yumura, S. Iijima, Science 2004, 306, 1362.
11. D. N. Hutchison, N. B. Morrill, Q. Aten, B. W. Turner, B. D. Jensen, L. L. Howell, R. R. Vanfleet, R. C. Davis, J. Microelectromech. Syst. 2010, 6, 75.
12. A. M. Morales, C. M. Lieber, Science 1998, 279, 208.
13. M. H. Park, M. G. Kim, J. Joo, K. Kim, J. Kim, S. Ahn, Y. Cui, J. Cho, Nano Lett. 2009, 9, 3844.
14. A. G. Cullis, L. T. Canham, Nature 1991, 353, 335.
15. J. Sha, J. Niu, X. Ma, J. Xu, X. Zhang, Q. Yang, D. Yang, Adv. Mater. 2002, 14, 1219.
16. X. Y. Zhang, L. D. Zhang, G. W. Meng, G. H. Li, N. Yun, J. Phillipp, F. Phillipp, Adv. Mater. 2001, 13, 1238.
17. H. Y. Tuan, D. C. Lee, T. Hanrath, B. A. Korgel, Nano Lett. 2005, 5, 681.
18. F. Müller, A. Birner, J. Schilling, A. P. Nielsch, K. Li, U. Gösele, V. Lehmann, Microsyst. Technol. 2002, 8, 7.
19. B. L. Wardle, D. S. Saito, E. J. Garcia, A. J. Hart, R. G. de Villoria, E. A. Verploegen, Adv. Mater. 2008, 20, 2707.
20. Q. Ngo, B. A. Cruden, A. M. Cassell, G. Sims, M. Meyyappan, J. Li, C. Y. Yang, Nano Lett. 2004, 4, 2403.
21. B. C. Satishkumar, A. Govindaraj, Manashi Nath, C. N. R. Rao, J. Mater. Chem. 2000, 10, 2115.
22. W. Q. Han, S. S. Fan, Q. Q. Li, Y. D. Hu, Science 1997, 277, 1287.
23. W. Wang, P. N. Kumta, J. Power Sources 2007, 172, 650.
24. J. Y. Eom, J. W. Park, H. S. Kwon, S. Rajendrana, J. Electrochem. Soc. 2006, 153, A1678.
25. L. F. Cui, Y. Yang, C. M. Hsu, Y Cui, Nano Lett. 2009, 9, 3370.
26. M. Liu, G. H. Lu, J. H. Chen, Nanotechnology 2008, 19, 265705.
27. H. Bing, T Niall, R. Fred, Anal. Chem. 1998, 70, 3790.
28. P. Gzil, N. Vervoort, G. V. Baron, G. Desmet, Anal. Chem. 2003, 75, 6244.
29. C. Smit, R. A. C. M. M. van Swaaij, H. Donker, A. M. H. N. Petit, W. M. M. Kessels, M. C. M. van de Sanden, J. Appl. Phys. 2003, 94, 3582.
30. J. X. Liu, J. J. Niu, D. R. Yang, M. Yan, J. Sha, Physica E 2004, 23, 221.
31. C. Lia, G. J. Fang, S. Sheng, Z. Q. Chen, J. B. Wang, S. Ma, X. Z. Zhao, Phys. E 2005, 30, 169.
32. S. Nakashima, M. Higashihira, K. Maeda, J. Am. Ceram. Soc. 2003, 86, 823.
33. J. Panitz, A. Wokaun, Appl. Spectrosc. 1998, 52, 1252.
34. P. M. Ajayan, S. Iijima, T. Ichihashi, Phys. Rev. B: Condens. Matter 1993, 47, 6859.
35. E. Dujardin, T. W. Ebbesen, H. Hiura, K. Tanigaki, Science 1994, 265, 1850.
36. T. I. Kamins, J. Electrochem. Soc.: Solid-State Sci. Technol. 1980, 127, 686.
37. A. T. Voutsas, M. K. Hatalis, J. Electrochem. Soc. 1992, 139, 2659.