High aspect ratio microstructures based on anisotropic porous materials

Microsystem Technologies

Volumn 8, Issue 1, 2002, Pages 7-9

  Muller F ^a   Birner, A ^a   Schilling, J ^a   Li, A P ^a   Nielsch, K ^a   Gosele U ^a   Lehmann, V ^b  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANISOTROPY; ETCHING; LITHOGRAPHY; POROUS SILICON;

ISOTROPIC ETCHING; POROUS ANODIC ALUMINA;

METALLOGRAPHIC MICROSTRUCTURE;

EID: 0036494214     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-002-0047-3     Document Type: Article

References (9)