Mechanical and tribological properties of coatings sputtered from SiC target in the presence of CH4 gas

Surface and Coatings Technology

Volumn 205, Issue 11, 2011, Pages 3372-3377

  Kulikovsky, V ^a,b   Vorlicek, V ^a   Ctvrtlik, R ^c   Bohac, P ^a   Suchanek, J ^d   Blahova, O ^e   Jastrabik, L ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

^c PALACKÝ UNIVERSITY   (Czech Republic)

^d CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^e UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Amorphous SiC films; Coefficient of friction; Hardness; Raman spectra; Sputtering

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; COATINGS; ELECTRON PROBE MICROANALYSIS; FRICTION; GAS MIXTURES; GASES; HARDNESS; RAMAN SCATTERING; SILICON; SILICON CARBIDE; SPUTTERING; TRIBOLOGY;

AMORPHOUS SIC; COEFFICIENT OF FRICTIONS; DC MAGNETRON SPUTTERING; HIGH COEFFICIENT-OF-FRICTION; HYDROGENATED SILICON CARBIDE (A-SIC:H) FILMS; LOW FRICTION COEFFICIENTS; MECHANICAL AND TRIBOLOGICAL PROPERTIES; TECHNOLOGICAL PARAMETERS;

AMORPHOUS SILICON;

EID: 79952771286     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.11.057     Document Type: Article

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