Hardness of nanocomposite a-C:Si films deposited by magnetron sputtering

Diamond and Related Materials

Volumn 16, Issue 1, 2007, Pages 167-173

  Kulikovsky, V ^a,b   Bohac P ^a   Zemek, J ^a   Vorlicek V ^a   Kurdyumov, A ^b   Jastrabik L ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

Author keywords

a C:Si hydrogen free films; Hardness; Raman spectra; XPS

Indexed keywords

ELECTRON DIFFRACTION; GRAPHITE; HARDNESS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHOTOELECTRON SPECTROSCOPY; RAMAN SCATTERING; SILICON CARBIDE; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION TEMPERATURE; EPMA; HYDROGEN FREE FILMS; INTRINSIC STRESS;

THIN FILMS;

EID: 33751219244     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.04.011     Document Type: Article

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