Comparative study of Ta-N and W-N films deposited by reactive magnetron sputtering

Nanoscience and Nanotechnology Letters

Volumn 3, Issue 2, 2011, Pages 280-284

  Yang, J F ^a   Yuan, Z G ^a   Wang, X P ^a   Fang, Q F ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

Author keywords

Hardness; Magnetron Sputtering; Tantalum Nitride; Tungsten Nitride

Indexed keywords

COMPARATIVE STUDIES; CRYSTALLINE STRUCTURE; MIXED PHASIS; NITROGEN PARTIAL PRESSURES; RADIO FREQUENCY REACTIVE MAGNETRON SPUTTERING; REACTIVE MAGNETRON SPUTTERING; TANTALUM NITRIDE; TUNGSTEN NITRIDE;

CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; HARDNESS; MAGNETRON SPUTTERING; MIXTURES; NITRIDES; PARTIAL PRESSURE; PRESSURE EFFECTS; TANNING; TANTALUM; TANTALUM COMPOUNDS; TUNGSTEN; TUNGSTEN COMPOUNDS;

METALLIC FILMS;

EID: 79952714000     PISSN: 19414900     EISSN: 19414919     Source Type: Journal    
DOI: 10.1166/nnl.2011.1153     Document Type: Conference Paper

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