Photoacid generating ligands for development of positive-tone directly photopatternable metal complexes

Langmuir

Volumn 27, Issue 6, 2011, Pages 3157-3165

  Cordonier, Christopher E J ^a   Nakamura, Akimasa ^a   Shimada, Kazuhiko ^a   Fujishima, Akira ^a  

^a CENTRAL JAPAN RAILWAY COMPANY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INDIUM TIN OXIDE; METAL OXIDE FILM; MICRO PATTERNING; PATTERNED FILMS; PHOTOACIDS; POSITIVE-TONE; SOLUBLE COMPLEXES; TITANIUM COMPLEXES;

BEARINGS (STRUCTURAL); INDIUM; INDIUM COMPOUNDS; LIGANDS; METAL COMPLEXES; PHENOLS; TIN; TIN OXIDES; TITANIUM; TITANIUM OXIDES;

OXIDE FILMS;

EID: 79952614426     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la104259f     Document Type: Article

References (43)

1. Thompson, L. F.; Willson, C. G.; Bowden, M. J. Introduction to Microlithography, 2 nd ed.; Oxford University Press: New York, 1994.
2. Willson, C. G.; Dammel, R. A.; Reiser, A. Proc. SPIE 1997, 3051, 28-41
3. Deforest, W. S. Photoresist: Materials and Processes; McGraw-Hill: New York, 1975.
4. Fluga, F.; Nicolau, D. V. Microelectron. Eng. 2009, 86, 783-786
5. Ohta, H.; Orita, M.; Hirano, M.; Tanji, H.; Kawazoe, H.; Hosono, H. Appl. Phys. Lett. 2000, 76, 2740-2742
6. Chopra, K. L.; Major, S.; Pandya, D. K. Thin Solid Films 1983, 102, 1-46
7. Chen, S.-Y.; Mo, T.-C.; Lin, S.-H. Ferroelectrics 2001, 263, 247-252
8. Milliron, D. L.; Raoux, S.; Shelby, R. M.; Jordan-Sweet, J. Nat. Mater. 2007, 6, 352-356
9. Park, Y. K.; Ahn, Y. S.; Lee, K. H.; Cho, C. H.; Chung, T. Y.; Kim, K. J. Semicond. Technol. Sci. 2003, 3, 76-82
10. Fujishima, A.; Honda, K. Nature 1972, 238, 37-38
11. Fujishima, A.; Rao, T. N.; Tyrk, D. A. J. Photochem. Photobiol. C: Rev. 2000, 1, 1-21
12. Kay, A.; Gratzel, M. Sol. Energy Mater. Sol. Cells 1996, 44, 99-117
13. Arango, A. C.; Johnson, L. R.; Carter, S. A.; Horhold, H. H. Adv. Mater. 2000, 12, 1689-1692
14. Gallagher, D.; Scanlan, F.; Houriet, R.; Mathieu, H. J.; Ring, T. A. J. Mater. Res. 1993, 8, 3135-3144
15. Schwartz, R. W. Chem. Mater. 1997, 9, 2325-2340
16. Bauerle, D. Laser Processing and Chemistry, 2 nd ed.; Springer Verlag: Berlin, 1996.
17. Li, Y.; Li, C.; He, D.; Li, J. J. Phys. D: Appl. Phys. 2009, 42, 105303
18. Bae, S.-W.; Park, H.-H.; Kim, T.-S. Sens. Actuators, A: Phys. 2006, 125, 548-552
19. Hong, C.-S.; Park, H.-H.; Wang, S.-J.; Moon, J.; Hill, R. H. Appl. Surf. Sci. 2006, 252, 7739-7742
20. Takahashi, M.; Ogata, T.; Cordonier, C. E. J.; Nakamura, A.; Shichi, T.; Uematsu, T. International Patent Application WO2009139421, 2009.
21. Zhang, X.; Hill, R. H. J. Photopolym. Sci. Technol. 2006, 19, 477-486
22. Bravo-Vasquez, J. P.; Hill, R. H. Polym. Mater. Sci. Eng. 1999, 81, 16-17
23. Patchornik, A.; Amit, B.; Woodward, R. B. J. Am. Chem. Soc. 1970, 92, 6333-6335
24. Fodor, S. P. A.; Read, J. L.; Pirrung, M. C.; Styrer, L.; Lu, A. T.; Solas, D. Science 1991, 251, 767-773
25. Beier, M.; Hoheisel, J. D. Nucleic Acids Res. 2000, 28, e11
26. Bardecker, J. A.; Afzali, A.; Tulevski, G. S.; Graham, T.; Hannon, J. B.; Jen, A. K.-Y. J. Am. Chem. Soc. 2008, 130, 7226-7227
27. Ahmad, S. A. A.; Wong, L. S.; ul-Haq, E.; Hobbs, J. K.; Leggett, G. J.; Micklefield, J. J. Am. Chem. Soc. 2009, 131, 1513-1522
28. Campo, A.; Boos, D.; Spiess, H. W.; Jonas, U. Angew. Chem., Int. Ed. Engl. 2005, 44, 4707-4712
29. Vossmeyer, T.; DeIonno, E.; Heath, J. R. Angew. Chem., Int. Ed. Engl. 1997, 36, 1080-1083
30. Bochet, C. G. J. Chem. Soc., Perkin Trans. 1 2002, 125-142
31. Pelliccioli, A. P.; Wirz, J. Photochem. Photobiol. Sci. 2002, 1, 441-458
32. McGall, G. H.; Barone, A. D.; Digglemann, M.; Fodor, S. P. A.; Gentalen, E.; Ngo, N. J. Am. Chem. Soc. 1997, 119, 5081-5090
33. Buler, S.; Lagoja, I.; Giegrich, H.; Stengele, K.-P.; Pfleiderer, W. Helv. Chim. Acta 2004, 87, 620-659
34. Creutz, C.; Chou, M. H. Inorg. Chem. 2008, 47, 3509-3514
35. Li, S.-C.; Diebold, U. Proc. SPIE 2009, 7396, 1-7
36. Ono, N.; Yamada, T.; Saito, T.; Tanaka, K.; Kaji, A. Bull. Chem. Soc. Jpn. 1978, 51, 2401-2404
37. Annan, T. A.; Tuck, D. G. Can. J. Chem. 1988, 66, 2935-2940
38. Gigant, K.; Rammal, A.; Henry, M. J. Am. Chem. Soc. 2001, 123, 11632-11637
39. Cameron, J. F.; Frechet., J. M. J. J. Am. Chem. Soc. 1991, 113, 4303-4313
40. Ito, T.; Terao, A.; Inao, Y.; Yamaguchi, T.; Mizutani, N. Proc. SPIE 2007, 6519, 65190J
41. Nakayama, T.; Ueda, M. J. Mater. Chem. 1999, 9, 697-702
42. Dammel, R. A. Diazonaphthoquinone-Based Resists, SPIE tutorial text TT11; SPIE Press: Bellingham, WA, 1991.
43. Suess, O. Liebigs Ann. Chem. 1944, 556, 65-66