Consequences of non-standard bleaching on microlithographic performance

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 783-786

  Fulga, Florin ^a   Nicolau, Dan V ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

Optical bleaching; Photolithography; Process latitude; Resist

Indexed keywords

BIOMEDICAL MICRODEVICES; ECONOMIC CONSIDERATIONS; HIGH RESOLUTIONS; LITHOGRAPHIC PROCESS; OPTICAL BLEACHING; PHOTOLITHOGRAPHY SIMULATIONS; PROCESS LATITUDE; RESIST; RESIST PROFILES; ROAD MAPS;

BLEACHING; CLEANING; PHOTOLITHOGRAPHY; SURFACE TREATMENT; TECHNOLOGICAL FORECASTING;

PHOTOBLEACHING;

EID: 67349217753     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.101     Document Type: Article

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