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Volumn 19, Issue 4, 2006, Pages 477-486

Positive and negative photolithographic deposition of titanium dioxide from photosensitive titanium complexes

Author keywords

Film deposition; Lithography; Photochemistry; Titanium complex

Indexed keywords


EID: 33748443971     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.477     Document Type: Article
Times cited : (13)

References (22)
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    • T. D. Flaim, D. J. Guerrero, M. R. Fowler, W. J. James, V. Petrovsky and H. U. Anderson, USA Patent No. 6, 303,270 (2001)
    • T. D. Flaim, D. J. Guerrero, M. R. Fowler, W. J. James, V. Petrovsky and H. U. Anderson, USA Patent No. 6, 303,270 (2001)
  • 9
    • 33748447037 scopus 로고    scopus 로고
    • R. H. Hill, P. J. Roman, S. Suh and X. Zhang, USA Patent Application, Application No. 10/377,533 (Filed USA Feb. 26, 2003), Publication number: US 2003-0190820 A1, Oct. 9, 2003
    • R. H. Hill, P. J. Roman, S. Suh and X. Zhang, USA Patent Application, Application No. 10/377,533 (Filed USA Feb. 26, 2003), Publication number: US 2003-0190820 A1, Oct. 9, 2003
  • 10
    • 33748457986 scopus 로고    scopus 로고
    • R. H. Hill, B. J. Palmer, Jr. Avey, A. Alfred, S. L. Blair, C-H. W. Chu, M. Gao and W. L. Law, USA Patent No. 5,534,312 (1996)
    • R. H. Hill, B. J. Palmer, Jr. Avey, A. Alfred, S. L. Blair, C-H. W. Chu, M. Gao and W. L. Law, USA Patent No. 5,534,312 (1996)
  • 14
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  • 15
    • 33748448750 scopus 로고    scopus 로고
    • ACADEMIC PRESS, San Diego • San Francisco • New York • Boston • London • Sydney • Tokyo
    • D. C. Bradley, R. C. Mehrotra, I. P. Rothwell and A. Singh, "Alkoxo and Aryloxo Derivatives of Metals", ACADEMIC PRESS, San Diego • San Francisco • New York • Boston • London • Sydney • Tokyo, 2001, p.73-77 and p.117-123
    • Alkoxo and Aryloxo Derivatives of Metals , vol.2001 , pp. 73-77
    • Bradley, D.C.1    Mehrotra, R.C.2    Rothwell, I.P.3    Singh, A.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.