SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 257, Issue 13, 2011, Pages 5480-5483

Behavior of oxygen in zinc oxide films through thermal annealing and its effect on sheet resistance

(5) Hiramatsu, Takahiro a Furuta, Mamoru a Matsuda, Tokiyoshi a Li, Chaoyang a Hirao, Takashi a

a KOCHI UNIVERSITY OF TECHNOLOGY (Japan)

Author keywords

Oxide semiconductor; Post annealing; Thermal desorption spectroscopy (TDS); X ray diffraction (XRD); Zinc oxide

Indexed keywords

ANNEALING; DEPOSITION; DESORPTION; II-VI SEMICONDUCTORS; METALLIC FILMS; OXIDE FILMS; OXIDE SEMICONDUCTORS; SHEET RESISTANCE; THERMAL DESORPTION SPECTROSCOPY; WIDE BAND GAP SEMICONDUCTORS; X RAY DIFFRACTION; ZINC OXIDE;

CRYSTALLINITIES; OXYGEN AMBIENT; OXYGEN ISOTOPES; POST ANNEALING; POST DEPOSITION ANNEALING; SIMS ANALYSIS; THERMAL DESORPTION SPECTROSCOPIES (TDS); THERMAL-ANNEALING;

OXYGEN VACANCIES;

EID: 79952535336 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.11.128 Document Type: Article

Times cited : (15)

References (17)

1
- 9744248669
- K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono Nature 432 2004 488
- (2004) Nature , vol.432 , pp. 488
- Nomura, K.¹ Ohta, H.² Takagi, A.³ Kamiya, T.⁴ Hirano, M.⁵ Hosono, H.⁶

2
- 34547499398
- T. Hirao, M. Furuta, H. Furuta, T. Matsuda, T. Hiramatsu, H. Hokari, and M. Yoshida SID Int. Symp. Dig. Tech. Pap. 37 2006 18
- (2006) SID Int. Symp. Dig. Tech. Pap. , vol.37 , pp. 18
- Hirao, T.¹ Furuta, M.² Furuta, H.³ Matsuda, T.⁴ Hiramatsu, T.⁵ Hokari, H.⁶ Yoshida, M.⁷

3
- 56549102107
- T. Hirao, M. Furuta, T. Hiramatsu, T. Matsuda, C. Li, H. Furuta, H. Hokari, M. Yoshida, H. Ishii, and M. Kakegawa IEEE Trans. Electron. Dev. 55 2008 3136
- (2008) IEEE Trans. Electron. Dev. , vol.55 , pp. 3136
- Hirao, T.¹ Furuta, M.² Hiramatsu, T.³ Matsuda, T.⁴ Li, C.⁵ Furuta, H.⁶ Hokari, H.⁷ Yoshida, M.⁸ Ishii, H.⁹ Kakegawa, M.¹⁰

4
- 55149104462
- J.K. Jeong, J.H. Jeong, J.H. Choi, J.S. Im, S.H. Kim, H.W. Yang, K.N. Kang, K.S. Kim, T.K. Ahn, H.-J. Chung, M. Kim, B.S. Gu, J.-S. Park, Y.-G. Mo, H.D. Kim, and H.K. Chung SID Int. Symp. Dig. Tech. Pap. 39 2008 1
- (2008) SID Int. Symp. Dig. Tech. Pap. , vol.39 , pp. 1
- Jeong, J.K.¹ Jeong, J.H.² Choi, J.H.³ Im, J.S.⁴ Kim, S.H.⁵ Yang, H.W.⁶ Kang, K.N.⁷ Kim, K.S.⁸ Ahn, T.K.⁹ Chung, H.-J.¹⁰ Kim, M.¹¹ Gu, B.S.¹² Park, J.-S.¹³ Mo, Y.-G.¹⁴ Kim, H.D.¹⁵ Chung, H.K.¹⁶

5
- 54549123492
- K.-S. Son, T.-S. Kim, J.-S. Jung, M.-K. Ryu, K.-B. Park, B.-W. Yoo, J.-W. Kim, Y.-G. Lee, J.-Y. Kwon, S.-Y. Lee, and J.-M. Kim SID Int. Symp. Dig. Tech. Pap. 39 2008 633
- (2008) SID Int. Symp. Dig. Tech. Pap. , vol.39 , pp. 633
- Son, K.-S.¹ Kim, T.-S.² Jung, J.-S.³ Ryu, M.-K.⁴ Park, K.-B.⁵ Yoo, B.-W.⁶ Kim, J.-W.⁷ Lee, Y.-G.⁸ Kwon, J.-Y.⁹ Lee, S.-Y.¹⁰ Kim, J.-M.¹¹

6
- 78249266251
- H. Ohara, T. Sasaki, K. Noda, S. Ito, M. Sasaki, Y. Endo, S. Yoshitomi, J. Sakata, T. Serikawa, and S. Yamazaki Jpn. J. Appl. Phys. 49 2010 03CD02-1
- (2010) Jpn. J. Appl. Phys. , vol.49
- Ohara, H.¹ Sasaki, T.² Noda, K.³ Ito, S.⁴ Sasaki, M.⁵ Endo, Y.⁶ Yoshitomi, S.⁷ Sakata, J.⁸ Serikawa, T.⁹ Yamazaki, S.¹⁰

7
- 76749123487
- M. Furuta, T. Nakanishi, M. Kimura, T. Hiramatsu, T. Matsuda, H. Furuta, T. Kawaharamura, C. Li, and T. Hirao Electrochem. Solid-State Lett. 13 2010 H101
- (2010) Electrochem. Solid-State Lett. , vol.13 , pp. 101
- Furuta, M.¹ Nakanishi, T.² Kimura, M.³ Hiramatsu, T.⁴ Matsuda, T.⁵ Furuta, H.⁶ Kawaharamura, T.⁷ Li, C.⁸ Hirao, T.⁹

8
- 34547828874
- T. Hiramatsu, M. Furuta, H. Furuta, T. Matsuda, and T. Hirao Jpn. J. Appl. Phys. 46 2007 3319
- (2007) Jpn. J. Appl. Phys. , vol.46 , pp. 3319
- Hiramatsu, T.¹ Furuta, M.² Furuta, H.³ Matsuda, T.⁴ Hirao, T.⁵

9
- 58549107356
- T. Hiramatsu, M. Furuta, H. Furuta, T. Matsuda, C. Li, and T. Hirao J. Cryst. Growth 311 2009 282
- (2009) J. Cryst. Growth , vol.311 , pp. 282
- Hiramatsu, T.¹ Furuta, M.² Furuta, H.³ Matsuda, T.⁴ Li, C.⁵ Hirao, T.⁶

10
- 77953134113
- T. Matsuda, M. Furuta, T. Hiramatsu, H. Furuta, C. Li, and T. Hirao Appl. Surf. Sci. 256 2010 6350
- (2010) Appl. Surf. Sci. , vol.256 , pp. 6350
- Matsuda, T.¹ Furuta, M.² Hiramatsu, T.³ Furuta, H.⁴ Li, C.⁵ Hirao, T.⁶

11
- 0001649616
- A.F. Kohan, G. Ceder, D. Morgan, and C.G. Van de Walle Phys. Rev. B 61 2000 15019
- (2000) Phys. Rev. B , vol.61 , pp. 15019
- Kohan, A.F.¹ Ceder, G.² Morgan, D.³ Van De Walle, C.G.⁴

12
- 34548185866
- F.A. Selim, M.H. Weber, D. Solodovnikov, and K.G. Lynn Phys. Rev. Lett. 99 2007 085502
- (2007) Phys. Rev. Lett. , vol.99 , pp. 085502
- Selim, F.A.¹ Weber, M.H.² Solodovnikov, D.³ Lynn, K.G.⁴

13
- 35148897661
- A. Janotti, and C.G. Van de Walle Phys. Rev. B 76 2007 165202
- (2007) Phys. Rev. B , vol.76 , pp. 165202
- Janotti, A.¹ Van De Walle, C.G.²

14
- 62549110942
- Y.S. Kim, and C.H. Park Phys. Rev. Lett. 10 2009 086403
- (2009) Phys. Rev. Lett. , vol.10 , pp. 086403
- Kim, Y.S.¹ Park, C.H.²

15
- 84891005643
- Wiley-VCH Verlag Gmbh&Co. KGaA
- M. Birkholz Thin Film Analysis by X-Ray Scattering 2006 Wiley-VCH Verlag Gmbh&Co. KGaA p. 110
- (2006) Thin Film Analysis by X-Ray Scattering
- Birkholz, M.¹

16
- 31144466486
- M. Rusop, K. Uma, T. Soga, and T. Jimbo Mater. Sci. Eng. B 127 2006 150
- (2006) Mater. Sci. Eng. B , vol.127 , pp. 150
- Rusop, M.¹ Uma, K.² Soga, T.³ Jimbo, T.⁴

17
- 42649124030
- G.Z. Xing, B. Yao, C.X. Cong, T. Yang, Y.P. Xie, B.H. Li, and D.Z. Shen J. Alloys Compd. 457 2008 36
- (2008) J. Alloys Compd. , vol.457 , pp. 36
- Xing, G.Z.¹ Yao, B.² Cong, C.X.³ Yang, T.⁴ Xie, Y.P.⁵ Li, B.H.⁶ Shen, D.Z.⁷

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.