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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 1, 2011, Pages

Cleaning of GaN (2̄110) surfaces

(8) Schulz, Ch a Kuhr, S a Geffers, H a Schmidt, Th a Flege, J I a Aschenbrenner, T a Hommel, D a Falta, J a

a UNIVERSITY OF BREMEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC STRUCTURE; CARBON REMOVAL; CLEAN SURFACES; CLEANING METHODS; DRY NITROGEN; GLOVEBOXES; OXYGEN REMOVAL; PLASMA CLEANING; RADIO FREQUENCIES; SAMPLE SURFACE; ULTRAHIGH VACUUM CONDITIONS;

DEGASSING; DIFFRACTION; GALLIUM ALLOYS; GALLIUM NITRIDE; IONIZATION OF GASES; LOW ENERGY ELECTRON DIFFRACTION; NITROGEN; NITROGEN PLASMA; OXYGEN; PLASMA DEPOSITION; SCANNING TUNNELING MICROSCOPY; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

CLEANING;

EID: 79952025810 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3520117 Document Type: Article

Times cited : (11)

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