Densification of sol-gel silica thin films induced by hard X-rays generated by synchrotron radiation

Journal of Synchrotron Radiation

Volumn 18, Issue 2, 2011, Pages 280-286

  Innocenzi, Plinio ^a   Malfatti, Luca ^a   Kidchob, Tongjit ^a   Costacurta, Stefano ^b   Falcaro, Paolo ^c   Marmiroli, Benedetta ^d   Cacho Nerin, Fernando ^d   Amenitsch, Heinz ^d  

^a UNIVERSITY OF SASSARI   (Italy)

^b Associazione CIVEN   (Italy)

^c CSIRO   (Australia)

^d ERICH SCHMID INSTITUTE OF MATERIALS SCIENCE   (Austria)

Author keywords

deep X ray lithography; sol gel; thin films

Indexed keywords

COATING LAYER; COVALENTLY BONDED; DEEP X-RAY LITHOGRAPHY; DIP COATING; DIRECT WRITING; EXPOSURE DOSE; HARD X RAY; HYBRID FILM; ORGANIC GROUP; ORGANIC-INORGANIC; PURE SILICA; SI-C BOND; SILANOL GROUPS; SILICA FILM; SOL-GEL SILICA; SOL-GEL THIN FILMS; SOURCE OF LIGHT; SYNCHROTRON SOURCE; X RAY BEAM;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; COATINGS; DENSIFICATION; ELECTRON BEAM LITHOGRAPHY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; GELS; HYBRID MATERIALS; PHOTODEGRADATION; RADIATION EFFECTS; REFRACTIVE INDEX; SILICA; SOL-GEL PROCESS; SOL-GELS; SOLS; SPECTROSCOPIC ELLIPSOMETRY; SYNCHROTRONS; THIN FILMS; X RAY LITHOGRAPHY; X RAY OPTICS; X RAYS;

FILM PREPARATION;

EID: 79951936496     PISSN: 09090495     EISSN: 16005775     Source Type: Journal    
DOI: 10.1107/S0909049510051666     Document Type: Article

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