Deep X-ray lithography for direct patterning of PECVD films

Plasma Processes and Polymers

Volumn 7, Issue 6, 2010, Pages 459-465

  Costacurta, Stefano ^b   Malfatti, Luca ^a   Patelli, Alessandro ^b   Falcaro, Paolo ^c   Amenitsch, Heinz ^d   Marmiroli, Benedetta ^d   Grenci, Gianluca ^e   Piccinini, Massimo ^f   Innocenzi, Plinio ^a  

^a UNIVERSITY OF SASSARI   (Italy)

^b Associazione CIVEN   (Italy)

^c CSIRO   (Australia)

^d ERICH SCHMID INSTITUTE OF MATERIALS SCIENCE   (Austria)

^e LABORATORIO TASC   (Italy)

^f Porto Conte Ricerche Srl   (Italy)

Author keywords

Deep x ray lithography; Infrared absorption spectroscopy (IR AS); Lithography; Plasma enhanced chemical vapour deposition (PECVD); Sol gel; Synchrotron light; Thin films; X ray

Indexed keywords

CHEMICAL ETCHING; CHEMICAL VAPOUR DEPOSITION; DEEP X-RAY LITHOGRAPHY; DIRECT WRITING; DIRECT-PATTERNING; ELLIPSOMETRIC SPECTROSCOPY; EXPOSURE DOSE; HARD X RAY; HIGH ENERGY PHOTONS; HIGH QUALITY; HYBRID FILM; INFRARED ABSORPTION SPECTROSCOPY (IR-AS); LITHOGRAPHY PROCESS; ORGANIC GROUP; ORGANIC-INORGANIC; PATTERNED STRUCTURE; RADIO FREQUENCY PLASMA; RUTHERFORD BACK-SCATTERING; SILICA HYBRIDS; SILICA NETWORKS; SYNCHROTRON LIGHT;

ABSORPTION; ANGLE MEASUREMENT; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONTACT ANGLE; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; GELS; INFRARED ABSORPTION; LIGHT; LITHOGRAPHY; MULTIPHOTON PROCESSES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; SOL-GEL PROCESS; SOL-GELS; SOLS; SYNCHROTRON RADIATION; SYNCHROTRONS; THERMOGRAPHY (IMAGING); THIN FILMS; VAPOR DEPOSITION; WAVELET TRANSFORMS; X RAY LITHOGRAPHY; X RAYS;

ABSORPTION SPECTROSCOPY;

EID: 77954943265     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900147     Document Type: Article

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