Direct writing for three-dimensional microfabrication using synchrotron radiation etching

Sensors and Actuators, A: Physical

Volumn 89, Issue 1-2, 2001, Pages 10-15

  Katoh, Takanori ^a   Nishi, Nobuyoshi ^b   Fukagawa, Masafumi ^b   Ueno, Hiroshi ^b   Sugiyama, Susumu ^b  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

^b RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FABRICATION; IRRADIATION; PHOTOCHEMICAL REACTIONS; SYNCHROTRON RADIATION; THREE DIMENSIONAL; X RAY LITHOGRAPHY;

DIRECT WRITING; PHOTOETCHING; THREE DIMENSIONAL MICROFABRICATION;

MICROACTUATORS;

EID: 0035281401     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(00)00528-8     Document Type: Article

References (12)

1. Reimer K., Henke W., Quenzer H.J., Pilz W., Wagner B. One-level gray-tone design-mask data preparation and pattern transfer. Microelectron. Eng. 30:1996;559-562.
2. S. Nicolas, Experimental study of gray-tone UV lithography of thick photoresist, Proc. Eurosensors XI (1997) 1271-1274.
3. Calderon G., Morris K., Vladimirsky O., Vladimirsky Y. Multi-level 3-D patterning of stacked PMMA sheets for X-ray microlithography. Proc. SPIE Conf. 2880:1996;231-236.
4. 2LIGA) process for control of side wall inclination. Proc. MEMS. 99:1999;252-256.
5. Feinerman A.D., Lajos R.E., White V., Denton D.D. X-ray lathe: an X-ray lithographic exposure tool for nonplanar objects. J. Microelectromech. Syst. 5:1996;250-255.
6. Zhang Y., Katoh T. Synchrotron radiation micromachining of polymers to produce high-aspect-ratio microparts. Jpn. J. Appl. Phys. 35:1996;L186-188.
7. Katoh T., Zhang Y. High aspect ratio micromachining by synchrotron radiation direct photo-etching. Microsyst. Technol. 4:1998;135-138.
8. Katoh T. Microfabrication process using synchrotron radiation excited photodecomposition. J. Jpn. Soc. Precision Eng. 64:1998;1008-1011.
9. Katoh T., Zhang Y. Synchrotron radiation ablative photodecomposition and production of crystalline fluoropolymer thin films. Appl. Phys. Lett. 68:1996;865-867.
10. Ueno H., Hosaka M., Tabata O., Konishi S., Sugiyama S. X-ray mask with SiC membrane for LIGA process. Trans. IEE Jpn. 119-E:1999;229-235.
11. Sugiyama S., Zhang Y., Ueno H., Hosaka M., Fujimoto T., Maeda R., Tanaka T. A compact SR beamline for fabrication of high aspect ratio MEMS microparts. Proc. MHS. 96:1996;79-84.
12. Nishi N., Katoh T., Ueno H., Konishi S., Sugiyama S. 3-Dimensional micromachining of PTFE using synchrotron radiation direct photo-etching. Proc. MHS. 99:1999;93-98.