Nonlinear piezoresistance of silicon

Proceedings of IEEE Sensors

Volumn , Issue , 2010, Pages 1950-1953

  Lemke, Benjamin ^a   Schmidt, Marek E ^a   Gutmann, Johannes ^a   Gieschke, Pascal ^a   Alpuimy, Pedro ^b   Gaspar, João ^a   Paul, Oliver ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

^b UNIVERSITY OF MINHO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

FOURTH ORDER POLYNOMIAL; FRACTURE STRAIN; FRACTURE STRESS; HIGHER ORDER; MECHANICAL LOADING; MICROTENSILE; NANOCRYSTALLINES; NONLINEAR BEHAVIOURS; NONLINEAR COEFFICIENT; PIEZO-RESISTIVE; PIEZORESISTANCE; PIEZORESISTANCE COEFFICIENTS; PIEZORESISTIVE SENSING; POLY-SI; POLYCRYSTALLINE; RESISTANCE MEASUREMENT; RESISTIVITY CHANGES; SECOND-ORDER POLYNOMIAL; SILICON MATERIALS; STRESS LEVELS; TRANSVERSE RESISTANCE; UNIFORM STRESS; WAFER-SCALE;

ELECTRIC RESISTANCE MEASUREMENT; FRACTURE; SEMICONDUCTING SILICON COMPOUNDS; SENSORS; SILICON; STRAIN; STRESS ANALYSIS;

SILICON WAFERS;

EID: 79951881681     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSENS.2010.5689973     Document Type: Conference Paper

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