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Current Applied Physics

Volumn 11, Issue 3, 2011, Pages 513-516

Effect of water treatment on transparent semiconductor InZnSnO thin films

(5) Moon, Joon Chul a Aksoy, Funda b,c Ju, Honglyoul a Liu, Zhi b Mun, Bongjin Simon d

a Yonsei University (South Korea)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

c CUKUROVA UNIVERSITY (Turkey)

d Hanyang University (South Korea)

Author keywords

Magnetron sputtering; Oxide thin films; Thin film transistors; XPS

Indexed keywords

CORE LEVELS; EFFECT OF WATER; NEGATIVE CHARGE; OXIDE THIN FILMS; TRANSPARENT SEMICONDUCTOR; TRANSPARENT THIN FILM; WATER EXPOSURE; WATER IMMERSION; XPS; XPS SPECTRA;

ADSORPTION; OXIDE FILMS; PHOTOIONIZATION; THIN FILM TRANSISTORS; THIN FILMS; TIN; WATER TREATMENT;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79951675735 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2010.09.004 Document Type: Article

Times cited : (4)

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